Measuring device for measuring refractive index of optical material based on quantum Zeno effect
A technology of optical materials and measuring devices, applied in measuring devices, material analysis through optical means, analyzing materials, etc., can solve the problems of optical path dissipation, loss of optical components, and inability to accurately measure the refractive index, etc., and achieve the goal of measuring devices Simplicity, low material consumption, compact structure effect
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[0032] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are part of the embodiments of the present invention, rather than All the embodiments; based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative work all belong to the protection scope of the present invention.
[0033] Such as figure 1 As shown, the present embodiment provides a measurement device based on the refractive index of optical materials under the quantum Zeno effect, including: base film Gaussian beam (Gaussian film), high-order Laguerre-Gaussian beam (high-order Laguerre-Gaussian mode) , unequal-arm MZ interferometer, and a high-resolution CCD imaging system; the basement membrane Gaussian beam and the high-orde...
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