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Continuous detection device for silicon wafer processing and production

A detection device and silicon wafer technology, applied in semiconductor/solid-state device testing/measurement, electrical components, semiconductor/solid-state device manufacturing, etc., can solve the problems of increasing enterprise costs, low production efficiency, slow production and processing speed, etc., to achieve The effect of improving speed and efficiency, reducing work steps, and reducing error rate

Inactive Publication Date: 2019-11-22
马鞍山致青工业设计有限公司
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  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to provide a continuous detection device for silicon wafer processing and production, to solve the above-mentioned background technology when silicon wafer processing and production in the existing market, generally use manual detection work, regular The shape inspection of silicon wafers is mainly observed by human eyes or with simple lenses. This method of inspection with human eyes not only has low work efficiency, but also has a very high false detection rate, and it is easy to cause The damage and contamination of silicon wafers, and the current testing equipment still needs manual loading and unloading, which is very troublesome. However, when only a single testing work can be performed, additional equipment is needed to carry out the rest of the testing work, which increases the cost of the enterprise. Cost, need to purchase additional equipment, also need to increase workers to work, the speed of production and processing is slow, and the production efficiency is not high

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  • Continuous detection device for silicon wafer processing and production
  • Continuous detection device for silicon wafer processing and production
  • Continuous detection device for silicon wafer processing and production

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Embodiment Construction

[0026] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0027] see Figure 1-8 , the present invention provides a technical solution: a continuous detection device for silicon wafer processing and production, comprising an equipment frame 1, the lower end of the equipment frame 1 is fixedly equipped with adjustable feet 2, and the outer side of the equipment frame 1 is movablely installed with maintenance Box 3, the main control box 4 is fixedly installed on the upper end of the equipment rack 1, the outer side of ...

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Abstract

The invention discloses a continuous detection device for silicon wafer processing and production. The detection device includes an equipment rack; adjustable supporting legs are fixedly mounted at the lower end of the equipment rack; an overhaul box is movably mounted on the outer side of the equipment rack; a main control box is fixedly mounted at the upper end of the equipment rack; heat dissipation holes are reserved in the outer side of the main control box; an observation door is movably installed on the outer side of the upper end of the equipment rack, a detection chamber is movably installed in the equipment rack, a conveying belt is movably installed in the detection chamber, a feeding table is movably installed at one end of the equipment rack, a feeding frame is movably installed at the upper end of the feeding table, and a discharging table is movably installed at the other end of the equipment rack. According to the continuous detection device for silicon wafer processingand production, the frequency of mutual contact between an operator and a product is reduced via the whole device, the product can be better protected, the problem that the product is damaged due tothe fact that the operator is accidentally making mistakes is solved, an error rate during operation is reduced, production work is better conducted, and the product percent of pass is increased.

Description

technical field [0001] The invention relates to the technical field of silicon wafer production, in particular to a continuous detection device for silicon wafer processing and production. Background technique [0002] Silicon is one of the most abundant elements in the earth's crust. The advantage of reserves is also one of the reasons why silicon has become the main material for photovoltaics. Now, single crystal and polycrystalline silicon are generally produced, which are characterized by high photoelectric conversion efficiency, long life and stability. Good performance, monocrystalline silicon is a relatively active non-metallic element, an important part of crystal materials, and is at the forefront of new material development. Its main uses are as semiconductor materials and the use of solar photovoltaic power generation, heating, etc. Solar energy has many advantages such as cleanliness, environmental protection, and convenience. Today, with the rapid development of...

Claims

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Application Information

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IPC IPC(8): H01L21/67H01L21/66
CPCH01L21/67011H01L21/67253H01L22/10
Inventor 王玉庆胡苏安
Owner 马鞍山致青工业设计有限公司