Substrate processing method and substrate processing device
A substrate processing method and a substrate processing device technology, which are applied to chemical instruments and methods, cleaning methods and utensils, cleaning methods using liquids, etc., can solve problems such as device quality degradation, and achieve the effect of inhibiting and reducing corrosion
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[0075] figure 1 It is a schematic top view for explaining the internal layout of the substrate processing apparatus 1 which is one embodiment of the present invention.
[0076] The substrate processing apparatus 1 is a sheet-type apparatus for processing substrates W such as silicon wafers one by one. In this embodiment, the substrate W is a disk-shaped substrate. The substrate W has a surface on which a metal film such as copper (Cu), cobalt (Co), nickel (Ni), or manganese (Mn) is exposed. The substrate processing apparatus 1 includes: a plurality of processing units 2 for processing the substrate W with processing liquids such as chemicals or rinse liquids; a load port (load port) LP is loaded with a carrier (carrier) C, and the carrier C is used for Accommodates a plurality of substrates W processed by the processing unit 2; the transfer robot IR and the transfer robot CR transfer the substrate W between the load port LP and the processing unit 2; and the controller 3 con...
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