Nano-abrasive, polishing liquid, preparation method and application

A technology of polishing liquid and nano-grinding, which is applied to polishing compositions containing abrasives, chemical instruments and methods, and other chemical processes. It can solve the problems of reducing the strength of the processed medium and failing to meet the polishing requirements of optical glass and optical instruments. , to achieve the effect of ensuring apparent quality and strength, convenient operation and simple process

Active Publication Date: 2021-10-12
LENS TECH CHANGSHA
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] One of the purposes of the present invention is to provide a nano-abrasive to improve the existing micro-defects such as large scratches and pits on the surface of the processed medium caused by the polishing liquid obtained by using the existing nano-alumina as an abrasive, reducing the impact of the processed medium. The strength cannot meet the technical problems of optical glass and optical instrument polishing requirements

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nano-abrasive, polishing liquid, preparation method and application
  • Nano-abrasive, polishing liquid, preparation method and application
  • Nano-abrasive, polishing liquid, preparation method and application

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0049] In a preferred embodiment of the present invention, the preparation method of the first abrasive material comprises the following steps: dissolving the first polymer in water, dispersing evenly to obtain a polymer solution, adding nano-alumina to the polymer solution, and stirring Uniform and dry to obtain the first abrasive.

[0050] In a preferred embodiment of the present invention, the nano-abrasive further includes a second abrasive, the second abrasive includes nano-cerium oxide, and the outer surface of the nano-cerium oxide is coated with a second polymer.

[0051] Nano cerium oxide can be used as a polishing abrasive, but when it is used as a polishing material to make a polishing liquid to polish the processed medium, it has the defects of long polishing time and low polishing efficiency.

[0052] By coating the outer surface of the nano-cerium oxide with the second polymer, the damage to the processed medium during the polishing process of the nano-cerium oxi...

Embodiment 1

[0108] This embodiment provides a nano-abrasive, including a first abrasive, the first abrasive is nano-alumina coated with a first polymer, and the particle size of the nano-alumina is 200nm, and the first polymer is methacrylate .

Embodiment 2

[0110] The present embodiment provides a nano-abrasive, comprising a first abrasive and a second abrasive, the mass ratio of the first abrasive to the second abrasive is 1:3, the first abrasive is nano-alumina coated with the first polymer, The second abrasive is nano-cerium oxide coated with a second polymer, wherein the particle size of nano-alumina is 80nm, the particle size of nano-cerium oxide is 300nm, and both the first polymer and the second polymer are ethacrylic acid ester.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
thicknessaaaaaaaaaa
particle diameteraaaaaaaaaa
Login to view more

Abstract

The present invention provides a kind of nano-abrasive, polishing liquid and preparation method and application, relate to the technical field of abrasive material, described nano-abrasive comprises first abrasive material, and described first abrasive material comprises nano-alumina, and the outer surface of described nano-alumina Covered with the first polymer, it improves the technical problem that the existing polishing liquid obtained by using nano-alumina as an abrasive will cause microscopic defects on the surface of the processed medium, reduce the strength of the processed medium, and fail to meet the polishing requirements of optical glass and optical instruments , the nano-abrasive provided by the present invention, by coating the polymer on the outer surface of the nano-alumina, the polymer can play a buffer role in the polishing process, so as to effectively reduce the microscopic defects on the surface of the processed medium caused by the abrasive, so as to ensure the surface of the processed medium The apparent quality and strength of the processing medium can meet the polishing needs of optical glass and optical instruments.

Description

technical field [0001] The invention relates to the technical field of abrasives, in particular to a nano-abrasive, a polishing liquid, a preparation method and an application. Background technique [0002] Chemical Mechanical Polishing (CMP) is a combined technology of mechanical grinding and chemical corrosion. It uses the grinding action of ultrafine particles and the chemical corrosion of polishing slurry to remove the polished medium in the alternating process of chemical action and mechanical action. An extremely thin layer of material on the surface for ultra-precise flat surface machining. CMP technology is considered to be the best and only global planarization technology for surface processing. The abrasive in the CMP polishing liquid has both a mechanical impact on the workpiece surface and a catalytic effect on the chemical reaction during the polishing process, which is an important factor affecting the polishing quality. [0003] The abrasive in the existing ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C09K3/14C09G1/02
CPCC09G1/02C09K3/1436
Inventor 周群飞陆继果
Owner LENS TECH CHANGSHA
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap