Monocrystalline silicon slicing device capable of freely adjusting size of wafer to be cut
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 江苏晶品新能源股份有限公司
- Publication Date
- 2020-01-03
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to the technical field of monocrystalline silicon, in particular to a monocrystalline silicon slicing device which can freely adjust the size of a cut wafer. Background technique
[0002] Single crystal of silicon, a crystal with a basically complete lattice structure, has different properties in different directions, is a good semiconductor material, used to manufacture semiconductor devices, solar cells, etc., the existing single crystal silicon is being processed and produced , it is necessary to cut a large volume of monocrystalline silicon into small parts, but the existing cutting device can only cut monocrystalline silicon into one size, which has great limitations, and the monocrystalline silicon is fixed during cutting. If it is not thorough, it is easy to move, causing cutting errors and wasting production resources. Therefore, we propose a single crystal silicon slicing device that can freely adjust the size of the cut ...