Gas-cross detection method, device and readable storage medium for multi-station deposition process
A technology of deposition process and detection method, which is applied in the direction of measuring devices, electrical components, semiconductor/solid-state device testing/measurement, etc., which can solve the problem of affecting product wafer film deposition quality and product yield, and cannot find menu debugging gas phenomenon in time, etc. problems, to ensure the quality of film deposition and product yield
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Embodiment 1
[0060] see Figure 1 to Figure 9 , the present embodiment provides a method for detecting cross gas in a multi-station deposition process, which is characterized in that it includes the following steps:
[0061] 1) Provide a multi-station deposition apparatus by which the multi-station deposition process is performed on one or more wafers, the multi-station deposition apparatus having multiple a station for accommodating a plurality of the wafers for a multi-station deposition process;
[0062] 2) performing film uniformity detection on the film deposited on the wafer surface that has completed the multi-station deposition process;
[0063] 3) gas supply flow detection is performed on the process gas supplied in the multi-station deposition process;
[0064] 4) According to the results of the detection of the uniformity of the thin film and the detection of the gas supply flow rate, it is determined whether there is a gas stream in the process of the multi-station deposition p...
Embodiment 2
[0081] This embodiment provides a gas-crossing detection device for a multi-station deposition process, which is characterized in that: it includes:
[0082] The film uniformity detection module is used to test the film uniformity of the film deposited on the wafer surface after the multi-station deposition process;
[0083] a gas supply flow detection module, which is used to detect the gas supply flow rate of the process gas supplied in the multi-station deposition process;
[0084] a controller, used for judging whether gas cross-flow occurs in the process of the multi-station deposition process according to the results of the film uniformity detection and the gas supply flow detection; the controller includes a memory and a processor, and the memory A computer program is stored, and the computer program is used by the processor to execute the gas cross-gas detection method described in the first embodiment.
[0085] Based on the cross-gas detection device for the multi-st...
Embodiment 3
[0092] This embodiment provides a computer-readable storage medium on which a computer program is stored, and is characterized in that: when the computer program is executed by a processor, the gas flow of the multi-station deposition process as described in the first embodiment is realized. Detection method.
[0093] As an example, those skilled in the art can understand that all or part of the processes in the methods of the above embodiments can be completed by instructing relevant hardware through a computer program, and the program can be stored in a computer-readable storage medium. When the program is executed, it may include the flow of the embodiments of the above-mentioned methods. Wherein, the storage medium can be a magnetic disk, an optical disk, a read-only memory (Read-Only Memory, ROM), a random access memory (Random Access Memory, RAM), a flash memory (Flash Memory), a hard disk (Hard Disk) Drive, HDD) or solid-state drive (Solid-State Drive, SSD), etc.; the ...
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Abstract
Description
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Application Information
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