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A kind of metal thin film preparation device and method suitable for polyhedral eutectic reflector

A metal thin film and preparation device technology, which is applied in metal material coating process, mirror, sputtering coating, etc., can solve the problems of poor film uniformity, high reflection, and affecting the performance of optical devices, etc., and achieve the effect of high utilization rate

Active Publication Date: 2021-08-03
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The preparation of the high reflection film on the surface of the mirror is the final step in the manufacture of the mirror. If the technical problems in the coating of the film on the surface of the polyhedron mirror cannot be solved, such as wide band, uniformity, high reflection, etc., it will affect Overall Optics Performance
[0005] Among the methods for preparing high-reflection films, magnetron sputtering is more suitable for coating complex-shaped surfaces to be coated, but the existing magnetron sputtering technology mainly uses disk targets and rectangular targets. The uniformity of the film prepared on a plane or a curved surface with a large radius of curvature can be guaranteed, but the uniformity of the film prepared on a multi-faceted conformal mirror, which is distributed around the central axis off-axis, is poor.
Special-shaped targets such as cylindrical targets are rarely used, and are only suitable for specific components to be plated, with poor versatility
And there is currently no other thin film deposition technology that can prepare a uniform high-reflection film on the polyhedron co-body mirror (because the cylindrical target is rarely used, so the development of the coating machine using the cylindrical target is not sufficient.
The existing cylindrical target coating machine generally only has the target rotating, the purpose is to ensure the uniform loss of the cylindrical target, and does not take into account the uniformity of the film

Method used

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  • A kind of metal thin film preparation device and method suitable for polyhedral eutectic reflector
  • A kind of metal thin film preparation device and method suitable for polyhedral eutectic reflector
  • A kind of metal thin film preparation device and method suitable for polyhedral eutectic reflector

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specific Embodiment approach 1

[0042] Specific implementation mode one: as Figure 1 to Figure 7As shown, this embodiment discloses a metal thin film preparation device suitable for polyhedron conformal reflectors, including a sealed cavity 1, an X-Y direction displacement platform 2, a cylindrical magnetron sputtering target 4 (the prior art), Turntable 3 (for prior art, outsourced product) and lifting mechanism 5; Described sealing cavity body 1 comprises sealing cavity 6 and sealing cavity cover 7;

[0043] The X-Y direction displacement platform 2 is fixedly connected with the lower surface of the sealing chamber cover 7, the sealing chamber cover 7 is arranged at the upper opening of the sealing chamber 6, and the outer wall of the sealing chamber cover 7 is fixedly connected with the lifting rod of the lifting mechanism 5 , the lifting mechanism 5 is fixedly connected to the outer wall of the sealed chamber 6 (the sealed chamber cover 7 is driven to move up and down by the lifting mechanism 5, thereby...

specific Embodiment approach 2

[0046] Specific implementation mode two: as Figure 1-Figure 4 As shown, this embodiment is a further description of specific embodiment one. The X-Y direction displacement platform 2 includes a Y direction displacement table 8, a screw one 9, a motor one 10 (servo motor), a drive block one 11, and an X direction displacement platform 2. Translation table 12, screw rod 2 13, motor 2 14 (servo motor) and drive block 2 15;

[0047] The lower surface of the sealed chamber cover 7 is fixed with a motor one 10, the output shaft of the motor one 10 is coaxially fixedly connected with one end of the screw rod one 9, the screw rod one 9 is arranged along the Y direction, and the driving block one 11 The middle part is provided with a screw hole screwed with the screw one 9, the driving block one 11 is screwed and connected with the screw one 9, the driving block one 11 is fixedly connected with the outer wall of the Y-direction displacement table 8, and the Y-direction displacement ta...

specific Embodiment approach 3

[0049] Specific implementation mode three: as figure 1 , Figure 5 and Figure 6 As shown, this embodiment is a further description of specific embodiment one. The lifting mechanism 5 is a motor-driven lifting mechanism, and the motor-driven lifting mechanism includes a driving motor 17, a driving screw 18 and a threaded sleeve 19; the sealing The lower part of the outer wall of the chamber 6 is fixed with a support body 20, the middle part of the support body 20 is provided with a through hole in the axial direction, the drive motor 17 is fixed on the bottom surface of the support body 20, and the output shaft of the drive motor 17 penetrates the through hole. In the hole, the drive screw 18 is vertically arranged, the lower end of the drive screw 18 is coaxial and fixedly connected to the output shaft of the drive motor 17, the upper end of the drive screw 18 is arranged in the threaded sleeve 19 and the two are screwed and connected, and the sealed cavity The outer wall o...

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Abstract

The invention discloses a metal thin film preparation device and method suitable for polyhedral eutectic reflectors, belonging to the field of metal thin film preparation. The device is: the X-Y direction displacement platform is affixed to the lower surface of the sealing chamber cover, the sealing chamber cover is affixed to the lifting rod of the lifting mechanism, the lifting mechanism is affixed to the outer wall of the sealing chamber, and the upper end of the cylindrical magnetron sputtering target is connected to the X ‑The lower surface of the Y-direction displacement platform is fixed, the lower end is set in the turntable, and the turntable is set in the sealed cavity. The method is: Step 1: Motion track planning; Step 2: Fine-tuning parameters and tracks; Step 3: Detachably fix the parts to be plated on the turntable, close the sealing chamber cover, the cylindrical target reaches the designated position, vacuumize and introduce working gas; Step 4: Check the reflectivity, if unqualified, go back to step 2, adjust the magnetron sputtering preparation parameters, and then check the uniformity, if unqualified, go back to step 1 to adjust the motion track; if qualified, use the current magnetron sputtering parameters and motion Locus mass production. The invention is used for the preparation of the metal thin film of the polyhedral eutectic reflector.

Description

technical field [0001] The invention belongs to the technical field of metal thin film preparation, and in particular relates to a metal thin film preparation device and method suitable for polyhedral conformal reflectors. Background technique [0002] The off-axis multi-reflection imaging system is a key component of a high-performance omnidirectional photoelectric detection system, and has broad application prospects in fields such as national defense security, aerospace, and new generation information technology that require a large field of view and high resolution for photoelectric systems. . Such as figure 1 As shown, the off-axis multi-mirror imaging system is composed of multiple optical free-form mirrors. During manufacturing, multiple reflectors are processed separately first. In order to increase the reflectivity, anti-reflection coatings are deposited on the surface of each reflector, and then the position and posture of each reflector are installed and adjuste...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/14G02B5/09G02B1/10
CPCC23C14/14C23C14/35G02B1/10G02B5/09
Inventor 闫永达毛立阳曹永智耿延泉史文博
Owner HARBIN INST OF TECH