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Magnet assembly, apparatus including the same, and method

A magnet assembly and assembly technology, applied in the direction of electrical components, ion implantation plating, coating, etc.

Pending Publication Date: 2020-03-24
SPTS TECH LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, although the overall thickness uniformity of the deposited film is low, typically less than 2% of the full range, there are short-range thickness variations corresponding to short-range fluctuations in the average magnetic field component, as figure 2 shown

Method used

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  • Magnet assembly, apparatus including the same, and method
  • Magnet assembly, apparatus including the same, and method
  • Magnet assembly, apparatus including the same, and method

Examples

Experimental program
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Embodiment Construction

[0061] The present invention will now be described in detail. Embodiments of the present invention have been found to significantly reduce short-range fluctuations in the average ion steering magnetic field component while still providing a time-averaged ion steering magnetic field strong enough to provide good intra-wafer stress control.

[0062] refer to Figure 5 , shows a magnet assembly 100 for controlling the thickness variation of a material layer, such as an AlScN piezoelectric layer, deposited using a physical vapor deposition (PVD) process, such as pulsed DC PVD, according to an embodiment of the invention On the substrate 230 (see Figure 15 ). Assembly 100 includes magnetic field generating means 110 for generating, in use, a magnetic field close to substrate 230 . The magnetic field generating device 110 includes a plurality of magnets 111 arranged in an array 110, wherein the plurality of magnets 111 surrounds the axis of rotation 101 ( Figure 9 off-page in ...

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PUM

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Abstract

Disclosed are a magnet assembly, an apparatus including the same, and a method. The magnet assembly is disclosed for steering ions used in the formation of a material layer upon a substrate during a pulsed DC physical vapour deposition process. Apparatus and methods are also disclosed incorporating the assembly for controlling thickness variation in a material layer formed via pulsed DC physical vapour deposition. The magnet assembly comprises a magnetic field generating arrangement for generating a magnetic field proximate the substrate and means for rotating the ion steering magnetic field generating arrangement about an axis of rotation, relative to the substrate. The magnetic field generating arrangement comprises a plurality of magnets configured to an array which extends around the axis of rotation, wherein the array of magnets are configured to generate a varying magnetic field strength along a radial direction relative to the axis of rotation.

Description

technical field [0001] The present invention relates to an apparatus and method for controlling the thickness variation of a layer of material formed via pulsed DC physical vapor deposition. Background technique [0002] Bulk acoustic wave (BAW) devices are used in mobile phones and other wireless applications to enable specific radio frequencies to be received and / or transmitted. These devices use the piezoelectric effect to generate mechanical resonance from an electrical input, which, conversely, can be used to generate an electrical output. [0003] BAW devices typically include multiple material layers deposited and patterned on a silicon (Si) substrate using standard semiconductor thin film processing techniques. Physical vapor deposition (PVD) is commonly used to deposit top and bottom metal electrodes and piezoelectric dielectric layers (such as AlN or AlScN). [0004] Factors that determine the performance of fabricated devices include electrical, mechanical, phys...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/54C23C14/22
CPCC23C14/34C23C14/542C23C14/22H01J37/3467H01J37/347H01J37/3266H01J37/32669H01J37/32422C23C14/351C23C14/345C23C14/0641C23C14/3485C23C14/35H01J37/3455H01J37/3405H01J37/3452C23C14/50C23C14/505H01J37/32715H01J37/345
Inventor 托尼·威尔比史蒂夫·伯吉斯艾德里安·托马斯R·辛德曼斯科特·海莫尔克莱夫·韦迪克斯I·蒙克里夫
Owner SPTS TECH LTD