Grid plate design method of air bath device, grid plate, air bath device and photoetching machine

A design method and grid plate technology, applied in the field of photolithography, can solve problems such as large shape and size restrictions, increased pressure resistance of filters, and large filter size, so as to improve quality, reduce thickness, and ensure uniformity Effects on sex and stability

Active Publication Date: 2020-03-31
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the filter will not only increase the pressure resistance, but also due to the large size of the filter, there are relatively large restrictions on the shape and size of the static pressure chamber of the air bath. When the installation space in the static pressure chamber is limited, it is difficult to install the filter in the static pressure chamber

Method used

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  • Grid plate design method of air bath device, grid plate, air bath device and photoetching machine
  • Grid plate design method of air bath device, grid plate, air bath device and photoetching machine
  • Grid plate design method of air bath device, grid plate, air bath device and photoetching machine

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Embodiment 2

[0108] image 3 A schematic structural diagram of the grid plate 10 provided in this embodiment. Such as image 3 As shown, this embodiment provides a grid plate 10, which is designed and formed by using the grid plate design method of the first embodiment.

[0109] Specifically, the grid plate 10 is a rectangular plate structure, on which a plurality of grids 13 are arranged, and the number of the grids 13 is the same as the number of the grids 13 in step S1 of the first embodiment, and the number of each grid 13 The ventilation area is the optimal ventilation area in step S5 of the first embodiment, and the position of each grid 13 is the same as the position of the grid 13 calculated and obtained in the first embodiment.

[0110] The grid plate 10 provided in this embodiment, because it is a non-uniform grid plate 10 obtained by adopting the grid plate design method of the first embodiment, can achieve better homogenization of the airflow in the air bath device, Improve ...

Embodiment 3

[0115] Figure 5 A schematic structural diagram of the grid plate 10 provided in this embodiment. Such as Figure 5 As shown, this embodiment provides an adjustable grid plate 10, which can adopt the grid plate design method provided in the first embodiment, and assist its own adjustment function, so that the grid plate 10 can be adjusted from the first embodiment. The initial design parameters are adjusted to the optimal design parameters in Embodiment 1 to obtain a non-uniform grid plate 10 design.

[0116] Specifically, such as Figure 5 As shown, the grid plate 10 provided in this embodiment includes a main body 1 and a grid adjustment assembly 2. A plurality of grids 13 are provided on the main body 1. The number, position and initial ventilation area of ​​the grids 13 are the same as those in the first embodiment. The parameters in step S1 are the same. The number and position of the adjustment components correspond to each grid 13 one by one, and the adjustment comp...

Embodiment 4

[0126] Such as Image 6 As shown, this embodiment provides an adjustable grid plate 10, which can adopt the grid plate design method provided in the first embodiment, and assist its own adjustment function, so that the grid plate 10 can be adjusted from the first embodiment. The initial design parameters are adjusted to the optimal design parameters in Embodiment 1 to obtain a non-uniform grid plate 10 design.

[0127] Specifically, such as Image 6 As shown, the grid plate 10 provided in this embodiment includes a main body 1 and a grid adjustment assembly 2. The main body 1 is provided with a plurality of grids 13, and the number and position of the adjustment components correspond to each grid 13 one by one. And the adjusting component can adjust the ventilation area of ​​the corresponding grid 13 to the optimal ventilation area.

[0128] In this embodiment, the body 1 has a hexahedral structure, and the length direction of the body 1 is arranged along the width direction...

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Abstract

The invention belongs to the technical field of photoetching, and particularly discloses a grid plate design method of an air bath device, a grid plate, the air bath device and a photoetching machine.The grid plate design method provided by the invention comprises the following steps: S1, determining initial design parameters of a grid plate, wherein the grid plate comprises a plurality of grids;S2, establishing a fluid simulation model of the air bath device according to the design parameters; S3, calculating to obtain fluid data of a fluid outlet; S4, judging whether the fluid data meets apreset condition or not, if yes, executing S5, and if not, executing S6; S5, adjusting the ventilation area of each grid or part of grids according to the fluid data, updating the design parameters and returning to S2; and S6, obtaining the optimal ventilation area of each grid. The grid plate is formed by adopting the grid plate design method, the air bath device comprises the grid plate, and the photoetching machine comprises the air bath device. Flowing uniformity and stability of the fluid outlet are improved.

Description

technical field [0001] The invention relates to the field of photolithography technology, in particular to a grid plate design method of an air bath device, a grid plate, an air bath device and a photolithography machine. Background technique [0002] In a thin film transistor (Thin Film Transistor) lithography machine, it is necessary to arrange an air bath device for the optical path of the interferometer to ensure the uniformity and stability of the temperature and pressure of the interferometer optical path. In the TFT lithography machine, in order to reduce the air supply pressure resistance in the optical path air bath device, ensure that the air supply surface can cover the optical path emitted by the interferometer, and avoid interference between the air bath device and the interferometer bracket, light outlet, and strip mirror , it is usually necessary to design the static pressure chamber of the light path air bath device into an L shape. Since the air bath inlet ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70883G03F7/70891G03F7/70408
Inventor 龚辉张洪博孙启峰张瑞平
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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