Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Dust-free treatment system for pharmaceutical industry production workshops

A production workshop and processing system technology, applied in the direction of gas treatment, dispersed particle filtration, membrane technology, etc., can solve the problems of poor dust-free treatment in the production workshop, and achieve easy cleaning and regeneration, convenient secondary use, and good cleaning fog effect effect

Inactive Publication Date: 2020-04-28
贵州圣济堂制药有限公司
View PDF5 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a dust-free treatment system for the production workshop of the pharmaceutical industry, so as to solve the problem that the dust-free treatment effect of the production workshop of the pharmaceutical industry is not good in the above-mentioned background technology

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Dust-free treatment system for pharmaceutical industry production workshops
  • Dust-free treatment system for pharmaceutical industry production workshops
  • Dust-free treatment system for pharmaceutical industry production workshops

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention.

[0027] see Figure 1-5 , an embodiment provided by the present invention: a dust-free treatment system for a production workshop in the pharmaceutical industry, including a base 1, a motor 4 is arranged above the base 1, a threaded rod 5 is arranged on one side of the motor 4, and the threaded rod 5 and the motor 4 Through the gear transmission connection, the top of the threaded rod 5 is provided with a placement frame 10, the outer wall of the threaded rod 5 is provided with a threaded block 9, and the threaded block 9 is threaded with the threaded rod 5, and the inner wall of the placement frame 10 and the base 1 is provided with chute 2, and chute 2 is provided w...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a dust-free treatment system for a pharmaceutical industry production workshop, which relates to the technical field of dust-free treatment systems, and aims to solve the problem of poor dust-free treatment effect of an existing production workshop in the pharmaceutical industry. A motor is arranged above the base; a threaded rod is arranged on one side of the motor; the threaded rod is in transmission connection with a motor through a gear; a placing rack is arranged above the threaded rod; a threaded block is arranged on the outer wall of the threaded rod; the threaded block is in threaded connection with the threaded rod; sliding grooves are formed in the inner walls of the placing rack and the base; the number of the sliding grooves is two, the sliding blocks are arranged in the two sliding grooves correspondingly; the sliding blocks are slidably connected with the sliding grooves, connecting lugs on the two sides of the threaded block are rotatably connected with connecting lugs on the sliding blocks through a first connecting rod and a second connecting rod correspondingly, a dust-free treatment chamber is arranged in the placing rack, a cover body isarranged above the dust-free treatment chamber, and the cover body is fixedly connected with the dust-free treatment chamber through locking bolts.

Description

technical field [0001] The invention relates to the technical field of dust-free treatment systems, in particular to a dust-free treatment system for production workshops in the pharmaceutical industry. Background technique [0002] The environmental temperature, humidity and purification degree of the workshop environment of pharmaceutical production enterprises are very high. Many equipment needs to be produced under vacuum conditions, such as aluminum-plastic packaging machines, tablet presses, capsule filling machines, bottling production lines and other equipment commonly used in packaging workshops, all of which are equipped with vacuum pumps, and the vacuum pumps of these equipment directly discharge the gas in the workshop , the exhausted gas not only pollutes the workshop environment, making the workshop unable to meet the purification requirements, but also makes it difficult to control the temperature and humidity in the workshop. Some bacteria and their spores, y...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B01D46/10B01D46/00B01D53/26A61L9/20
CPCA61L9/20B01D46/0036B01D46/10B01D53/26B01D2253/102B01D2257/91B01D2258/06
Inventor 王定兵黄俊
Owner 贵州圣济堂制药有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com