Curved surface lithography method using dmd and liquid crystal modulation

Abstract

The invention relates to a curved surface photolithography method using DMD and liquid crystal modulation, and belongs to the field of photolithography technology. DMD is used as a digital grayscale mask modulator to modulate the amplitude of the incident light, and liquid crystal is added as a phase modulator to modulate the phase of the incident light, thereby converting the incident plane wave into a beam with a specific wavefront, and then Through the projection lens, the image is finally formed on the curved photoresist substrate, thereby realizing curved surface lithography. Due to the introduction of DMD and liquid crystal to jointly modulate the light beam, the design freedom of the system is increased, thereby realizing efficient and high-precision curved surface lithography. It lays a certain foundation for the wide application of curved surface microstructure devices.

Description

technical field [0001] The invention belongs to the technical field of photolithography, and relates to a curved surface photolithography method using DMD and liquid crystal modulation. Background technique [0002] Photolithography technology is still the basic process technology for the entire semiconductor manufacturing and micro-nano structure device manufacturing. It is widely used in semiconductor micro-nano manufacturing, modern industry and other fields. [0003] The current lithography process mainly includes three methods: contact lithography, proximity lithography and projection lithography. [0004] Contact lithography has the advantages of simple equipment, fast speed, and high output. However, during the exposure process, the mask plate is in direct contact with the photoresist, and the photoresist is easy to pollute the mask plate, affecting the image quality and reducing Increased mask reusability; [0005] Proximity lithography is improved on the basis of...

AI Technical Summary

Problems solved by technology

[0009] Although there are many advantages, the processing of optical elements with curved surface microstructures is still an urgent problem to be solved.

At present, curved surface imprinting and diamond single-point processing are generally used, which are low in efficiency and high in cost, and are not suitable for batch processing.

However, the traditional DMD maskless lithography cannot directly achieve high-precision lithography on curved surfaces.

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