Susceptor and mocvd device comprising same

Abstract

The present invention relates to a susceptor having a coating layer configured to reduce the temperature deviation on a support surface thereof, and an MOCVD device comprising the same. A susceptor according to an embodiment of the present invention may have a support surface that contacts a substrate and supports the substrate and a side surface connected to the support surface, and may be configured such that the same is induction-heated by an induction coil, thereby heating the substrate while supporting the same. The susceptor may comprise: a base material made of a material that can be induction-heated in response to the induction coil; and a coating layer applied on a partial surface of the base material or on the entire surface thereof so as to form a part of the support surface orthe entire support surface, the coating layer having a magnetic property different from the magnetic property of the base material. The susceptor and the MOCVD device comprising the same, according tothe present invention, are advantageous in that, since temperature irregularity on the support surface that support the substrate is reduced, it is possible to grow a thin film having more uniform characteristics on the substrate, and a high yield can be obtained when an element is fabricated by using a substrate grown by a MOVDC process. In addition, the MOCVD device according to the present invention makes it possible to accurately measure the temperature on the support surface.

Description

technical field [0001] The present invention relates to a susceptor and an MOCVD apparatus provided with the susceptor, more particularly to a susceptor capable of measuring the correct temperature on the supporting surface by reducing the temperature deviation on the supporting surface by coating and having the substrate Seat MOCVD device. Background technique [0002] Chemical Vapor Deposition (CVD; Chemical Vapor Deposition) refers to a technique in which a raw material gas is flowed on a coated substrate and external energy is applied to decompose the raw material gas to form a thin film through a gas phase chemical reaction. [0003] In order to perform chemical reactions normally, various process conditions and environments need to be precisely controlled, and energy for activation needs to be supplied so that raw material gases spontaneously cause chemical reactions. [0004] Chemical vapor deposition can be divided into LPCVD (Low PressureCVD; Low Pressure Chemical ...

AI Technical Summary

Problems solved by technology

[0017] However, in the case of using a cascaded induction coil, when a cylindrical susceptor having a diameter of 100 mm or more is used due to the imbalance of the induced current inside the susceptor, there is a temperature difference in the central portion above the susceptor. The problem point that the edge part is significantly low

[0018] That is, there is a pr

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