A perovskite photodetector based on active layer optimization and its preparation method
A photodetector, perovskite technology, applied in photovoltaic power generation, electric solid-state devices, semiconductor/solid-state device manufacturing, etc. problems, to achieve the effect of improving uniformity and flatness, improving environmental stability, and reducing the probability of compounding
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Embodiment 1
[0032] Example 1: Control group
[0033] Clean the substrate composed of a transparent substrate 1 and a transparent conductive ITO anode 2 with a surface roughness less than 1 nm, and dry it with nitrogen after cleaning; spin-coat TAPC solution (2500rpm, 40s) on the surface of the transparent conductive ITO anode 2 (2500rpm, 40s), and Conduct thermal annealing treatment (120°C, 20min) to prepare hole transport layer 3; spin-coat CH on hole transport layer 3 3 NH 3 PbI 3 Solution (4000rpm, 25s), 300μL of chlorobenzene was added dropwise as anti-solvent when rotating for 9s, and thermal annealing treatment (110°C, 20min) was performed to prepare perovskite photoactive layer 4; spin coating on the surface of perovskite photoactive layer 4 PC 61 BM solution (4000rpm, 40s), and thermal annealing treatment (110℃, 20min) to prepare hole transport layer 3; Evaporate cathode buffer layer 6 on hole transport layer 3: Bphen (1nm); On cathode buffer layer 6 Evaporated metal cathode 7...
Embodiment 2
[0035] Clean the substrate composed of a transparent substrate 1 and a transparent conductive ITO anode 2 with a surface roughness less than 1 nm, and dry it with nitrogen after cleaning; spin-coat TAPC solution (2500rpm, 40s) on the surface of the transparent conductive ITO anode 2 (2500rpm, 40s), and Conduct thermal annealing treatment (120 °C, 20 min) to prepare hole transport layer 3; spin-coat CH doped with 0.5 mg / ml PFN-Br on hole transport layer 3 3 NH 3 PbI 3 Solution (4000rpm, 25s), 300 μL of chlorobenzene was added dropwise as an anti-solvent while rotating for 9s, and thermal annealing treatment (110°C, 20min) was performed to prepare perovskite photoactive layer 4; spin on the surface of perovskite photoactive layer 4. Coated PC 61BM solution (4000rpm, 40s), and thermal annealing treatment (110℃, 20min) to prepare hole transport layer 3; Evaporate cathode buffer layer 6 on hole transport layer 3: Bphen (1nm); On cathode buffer layer 6 Evaporated metal cathode 7:...
Embodiment 3
[0037] Clean the substrate composed of a transparent substrate 1 and a transparent conductive ITO anode 2 with a surface roughness less than 1 nm, and dry it with nitrogen after cleaning; spin-coat TAPC solution (2500rpm, 40s) on the surface of the transparent conductive ITO anode 2 (2500rpm, 40s), and Conduct thermal annealing treatment (120 °C, 20 min) to prepare hole transport layer 3; spin-coat CH doped with 1 mg / ml PFN-Br on hole transport layer 3 3 NH 3 PbI 3 Solution (4000rpm, 25s), 300μL of chlorobenzene was added dropwise as anti-solvent when rotating for 9s, and thermal annealing treatment (110°C, 20min) was performed to prepare perovskite photoactive layer 4; spin coating on the surface of perovskite photoactive layer 4 PC 61 BM solution (4000rpm, 40s), and thermal annealing treatment (110℃, 20min) to prepare hole transport layer 3; Evaporate cathode buffer layer 6 on hole transport layer 3: Bphen (1nm); On cathode buffer layer 6 Evaporated metal cathode 7: Ag (1...
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