Space extreme ultraviolet photometer
An extreme ultraviolet light and extreme ultraviolet technology, applied in the field of extreme ultraviolet optical devices, can solve the problems of inability to accurately measure brightness, inability to detect extreme ultraviolet targets, and lack of high suppression ratio, etc., and achieve the effect of light weight, simple structure and small volume
Inactive Publication Date: 2020-05-22
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
View PDF3 Cites 3 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
In the space environment, due to the absence of the atmosphere and the existence of the ozone layer, the light radiation of various bands from the target and the particle radiation of different energies from the cosmic background can all be irradiated into the measuring instrument, but currently there is no available band-pass, high rejection ratio The extreme ultraviolet transmission filter cannot accurately measure the extreme ultraviolet radiation brightness of a specific band, and cannot detect a large number of extreme ultraviolet targets with research value
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment approach
[0026] The space EUV photometer provided by the present invention, the specific embodiment is as follows:
[0027] The space extreme ultraviolet photometer provided by the present invention comprises: light entrance thin-film filter (plated the filter of 150nm Al film), the optical system that two EUV narrow-band multilayer reflectors 1,2 form, reflector The heavy metal baffle plate on the back, and the photodiode detector coated with thin film; the schematic diagram of its optical path can be found in figure 1 .
[0028] The thin film filter at the light entrance can preliminarily filter out the far ultraviolet, ultraviolet and visible light signals outside the working band, and at the same time play a role in temperature control to reduce the internal temperature.
[0029] figure 2 It is the transmittance curve of the metal thin film filter at the light entrance (150nm Al film). It can be seen from the figure that the filter is used to filter part of the X-ray radiation ...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
| Property | Measurement | Unit |
|---|---|---|
| Thickness | aaaaa | aaaaa |
Login to View More
Abstract
The invention relates to a space extreme ultraviolet photometer, and relates to the technical field of extreme ultraviolet optical devices. The technical problem of no high-rejection-ratio band pass filter in the extreme ultraviolet band is solved. The space extreme ultraviolet photometer is composed of an optical system, a reflector back heavy metal baffle plate and a photodiode detector, whereinthe optical system is composed of a film absorption filter and an extreme ultraviolet narrow-band multilayer film reflector. According to the invention, the optical system composed of the extreme ultraviolet narrow-band multilayer film reflector is combined with the film absorption filter, the reflector back heavy metal baffle plate and the high-sensitivity photodiode detector to form the extremeultraviolet photometer, and high-precision quantitative detection of the extreme ultraviolet radiation of a space target can be realized through high-precision calibration of the ground. The space extreme ultraviolet photometer provided by the invention has the characteristics of simple structure, small size, light weight and high reliability, not only can detect the radiance of a space target ina specific extreme ultraviolet waveband, but also can be widely applied to on-orbit calibration of a space load in the waveband.
Description
technical field [0001] The invention relates to the technical field of extreme ultraviolet optical devices, in particular to a space extreme ultraviolet photometer, which utilizes an extreme ultraviolet narrow-band multilayer film mirror optical system to filter out high-energy radiation and extreme ultraviolet out-of-band radiation, and uses a thin-film absorption filter to filter out Cut out long-wavelength optical radiation and detect extreme ultraviolet radiation in specific wavelength bands. Background technique [0002] In the field of extreme ultraviolet optics, especially when carrying out extreme ultraviolet monitoring on space targets, it is necessary to quantitatively measure the absolute intensity of extreme ultraviolet radiation from the target source. For this reason, it is necessary to design a small, high-reliability EUV photometer suitable for space applications. In the space environment, due to the absence of the atmosphere and the existence of the ozone l...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More IPC IPC(8): G01J1/42G01J1/02G01J1/04
CPCG01J1/0214G01J1/0492G01J1/429
Inventor 何玲平陈波毛石磊韩振伟郭权锋宋克非张宏吉刘阳王孝东
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI