Gas pressurized filling system and pressurized filling method
A gas pressurization and gas heating device technology, which is applied in the container filling method, the container discharge method, the installation device of the container structure, etc. Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0086] A method for pressurizing xenon gas by using the gas pressurizing charging system provided by the specific embodiment, the method specifically includes the following steps:
[0087] (1) Gas collection in the first gas collection chamber 9: The liquid nitrogen tanker fills the first auxiliary charging chamber 10 with liquid nitrogen through the first liquid pipeline 5, and the liquid nitrogen circulates through the outer circulation pipeline to maintain the first auxiliary charging chamber 10. In a low temperature environment (-196°C) in the auxiliary charging chamber 10, the xenon gas cylinder is injected into the first gas collection chamber 9 at a flow rate of 100 L / min, the outlet pressure of the xenon gas cylinder is 5 bar, and the xenon gas is in the first gas collection chamber. 9 is cooled to liquid state by low temperature liquid nitrogen;
[0088] (2) Gas charging in the first gas collection chamber 9: After the xenon gas in the first gas collection chamber 9 i...
Embodiment 2
[0093] A method for pressurizing krypton gas using the gas pressurization filling system provided by the specific embodiment, the method specifically includes the following steps:
[0094] (1) Gas collection in the first gas collection chamber 9: The liquid nitrogen tanker fills the first auxiliary charging chamber 10 with liquid nitrogen through the first liquid pipeline 5, and the liquid nitrogen circulates through the outer circulation pipeline to maintain the first auxiliary charging chamber 10. In a low temperature environment (-196°C) in the auxiliary charging chamber 10, the krypton gas cylinder injects krypton gas into the first gas collection chamber 9 at a flow rate of 2000 L / min. The gas outlet pressure of the krypton gas cylinder is 5.6 bar, and the krypton gas is The first gas collection chamber 9 is cooled to a liquid state by low-temperature liquid nitrogen;
[0095] (2) Gas charging in the first gas collection chamber 9: After the krypton gas in the first gas c...
Embodiment 3
[0100] A method for pressurizing and charging radon gas using the gas pressurization charging system provided by the specific embodiment, the method specifically comprises the following steps:
[0101] (1) Gas collection in the first gas collection chamber 9: The liquid nitrogen tanker fills the first auxiliary charging chamber 10 with liquid nitrogen through the first liquid pipeline 5, and the liquid nitrogen circulates through the outer circulation pipeline to maintain the first auxiliary charging chamber 10. In a low temperature environment (-196°C) in the auxiliary charging chamber 10, the radon gas cylinder injects radon gas into the first gas collection chamber 9 at a flow rate of 4000L / min. A gas collection chamber 9 is cooled to a liquid state by low-temperature liquid nitrogen;
[0102] (2) Gas charging in the first gas collection chamber 9: After the radon gas in the first gas collection chamber 9 is completely cooled to a liquid state by liquid nitrogen, the gas in...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 

