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Gas pressurized filling system and pressurized filling method

A gas pressurization and gas heating device technology, which is applied in the container filling method, the container discharge method, the installation device of the container structure, etc. Effect

Active Publication Date: 2022-05-24
SHANGHAI ZHENGFAN TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The filling of high-purity gas is usually boosted by compressors or booster pumps, but compressors and booster pumps contain many moving parts, with complex structures, high investment costs, high failure rates, high pollution risks, and heavy system quality.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0086] A method for pressurizing xenon gas by using the gas pressurizing charging system provided by the specific embodiment, the method specifically includes the following steps:

[0087] (1) Gas collection in the first gas collection chamber 9: The liquid nitrogen tanker fills the first auxiliary charging chamber 10 with liquid nitrogen through the first liquid pipeline 5, and the liquid nitrogen circulates through the outer circulation pipeline to maintain the first auxiliary charging chamber 10. In a low temperature environment (-196°C) in the auxiliary charging chamber 10, the xenon gas cylinder is injected into the first gas collection chamber 9 at a flow rate of 100 L / min, the outlet pressure of the xenon gas cylinder is 5 bar, and the xenon gas is in the first gas collection chamber. 9 is cooled to liquid state by low temperature liquid nitrogen;

[0088] (2) Gas charging in the first gas collection chamber 9: After the xenon gas in the first gas collection chamber 9 i...

Embodiment 2

[0093] A method for pressurizing krypton gas using the gas pressurization filling system provided by the specific embodiment, the method specifically includes the following steps:

[0094] (1) Gas collection in the first gas collection chamber 9: The liquid nitrogen tanker fills the first auxiliary charging chamber 10 with liquid nitrogen through the first liquid pipeline 5, and the liquid nitrogen circulates through the outer circulation pipeline to maintain the first auxiliary charging chamber 10. In a low temperature environment (-196°C) in the auxiliary charging chamber 10, the krypton gas cylinder injects krypton gas into the first gas collection chamber 9 at a flow rate of 2000 L / min. The gas outlet pressure of the krypton gas cylinder is 5.6 bar, and the krypton gas is The first gas collection chamber 9 is cooled to a liquid state by low-temperature liquid nitrogen;

[0095] (2) Gas charging in the first gas collection chamber 9: After the krypton gas in the first gas c...

Embodiment 3

[0100] A method for pressurizing and charging radon gas using the gas pressurization charging system provided by the specific embodiment, the method specifically comprises the following steps:

[0101] (1) Gas collection in the first gas collection chamber 9: The liquid nitrogen tanker fills the first auxiliary charging chamber 10 with liquid nitrogen through the first liquid pipeline 5, and the liquid nitrogen circulates through the outer circulation pipeline to maintain the first auxiliary charging chamber 10. In a low temperature environment (-196°C) in the auxiliary charging chamber 10, the radon gas cylinder injects radon gas into the first gas collection chamber 9 at a flow rate of 4000L / min. A gas collection chamber 9 is cooled to a liquid state by low-temperature liquid nitrogen;

[0102] (2) Gas charging in the first gas collection chamber 9: After the radon gas in the first gas collection chamber 9 is completely cooled to a liquid state by liquid nitrogen, the gas in...

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Abstract

The invention provides a gas pressurized filling system and a pressurized filling method. The gas pressurized filling system includes a gas source to be pressurized, an auxiliary pressurized gas source, a gas heating device and at least one collecting and evaporating device; The collection and evaporation device includes a gas collection chamber and an auxiliary pressurization chamber nested in sequence from the inside to the outside, the gas source to be pressurized is connected to the gas collection chamber, and the gas outlet of the auxiliary pressurized gas source is divided into Two lines, one is directly connected to the auxiliary pressurized chamber, and the other is connected to the auxiliary pressurized chamber through a gas heating device. The invention uses low-temperature liquid nitrogen for cooling, and first collects the gas to be pressurized into the gas collection chamber for liquefaction or solidification. After the collection is full, it is vaporized by heating with hot nitrogen. By controlling the nitrogen heating temperature, the filling pressure of the gas to be pressurized is controlled. The gas pressurization process is realized by using the volume expansion caused by the phase transition.

Description

technical field [0001] The invention belongs to the technical field of gas charging, and relates to a gas pressurizing and charging system and a pressurizing charging method, in particular to a rare gas pressurizing and charging system and a pressurizing charging method utilizing rare gas phase change. Background technique [0002] In the field of chemical gas separation technology, it is necessary to involve gas filling, that is, after the target gas in the gas storage tank is pressurized to a certain filling pressure, the molding machine is started to fill the high-pressure gas such as gas cylinders under the premise of ensuring the purity. [0003] CN109185695A discloses a high-pressure gas filling system, comprising: a first pressurizing assembly, the inlet of the first pressurizing assembly is connected with the outlet pipeline of a gas source; a capacity expansion assembly, the gas volume of the capacity expansion assembly is greater than or equal to The single target ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F17C5/06F17C7/04F17C13/02F17C13/04
CPCF17C5/06F17C7/04F17C13/02F17C13/025F17C13/026F17C13/028F17C13/04F17C2227/04F17C2221/01F17C2223/013F17C2250/0421F17C2250/0408F17C2250/03F17C2205/0332F17C2205/0323F17C2223/035F17C2250/043F17C2250/0439F17C2250/0426
Inventor 李东升
Owner SHANGHAI ZHENGFAN TECH