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Calibration ruler and position calibration method using calibration ruler

A calibration method and a calibration ruler technology, which are applied in the photo-plate-making process of the pattern surface, the exposure device of the photo-plate-making process, optics, etc., can solve the problems of high cost, complex structure, unfavorable installation and maintenance, etc., and achieve reduction of production cost, The effect of reducing design complexity and facilitating maintenance and calibration

Active Publication Date: 2020-06-02
SUZHOU YUANZHUO OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Relatively speaking, the structure is more complicated and the cost is higher, which is not conducive to installation and maintenance

Method used

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  • Calibration ruler and position calibration method using calibration ruler
  • Calibration ruler and position calibration method using calibration ruler
  • Calibration ruler and position calibration method using calibration ruler

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Embodiment Construction

[0023] Such as Figure 1-3 As shown, a calibration ruler for calibrating the positional relationship, the calibration ruler 1 is in the shape of a strip, preferably in the shape of a long rectangular strip, and other irregular figures in the shape of a strip can also be used. The surface of the calibration ruler 1 is coated with a photosensitive material 10, the photosensitive material 10 can be coated with the upper surface 11 of the calibration ruler, and can also be coated with the lower surface 12 of the calibration ruler, when the photosensitive material 10 When coating the lower surface 12 of the calibration ruler, the calibration ruler 1 needs to use light-transmitting materials, such as glass and other light-transmitting materials, to ensure that the selected material can be normally exposed to light and processed by the machine vision system after exposure.

[0024] The photosensitive material 10 coated on the said scale 1 has the function of gradually fading after be...

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Abstract

The invention discloses a calibration ruler and a position calibration method using the calibration ruler. The calibration ruler is in a long strip shape, is fixed to one side of a workpiece table andsynchronously moves along with the workpiece table. The surface of the calibration ruler is coated with a photosensitive material, an exposure mark can be formed on the photosensitive material through exposure, and the mark is gradually thinned and finally disappears as time passed after exposure, so that repeated exposure can be conducted on the calibration ruler, and repeated utilization is achieved. The calibration ruler is fixed to one side of the workpiece table after being assembled. According to the assembly position relation related to exposure, a mark can be exposed on the calibration ruler, and the related position relation can be obtained by measuring the position of the workpiece table. The adopted moving mechanism only relates to the moving mechanism of the workpiece table, so that errors among a plurality of moving mechanisms are avoided.

Description

technical field [0001] The invention relates to the technical field of lithography, in particular to a calibration ruler for lithography direct writing equipment and a position calibration method using the calibration ruler, which belongs to the technical field of rapid exposure of direct writing lithography. Background technique [0002] Photolithography is used to print a pattern of features on the surface of a substrate. Such substrates may include substrates used in the fabrication of semiconductor devices, various integrated circuits, flat panel displays (eg, liquid crystal displays), circuit boards, biochips, micromechanical electronic chips, optoelectronic circuit chips, and the like. Direct writing lithography technology plays a very important role in the field of semiconductor and PCB production by replacing the direct image transfer technology exposed by traditional masks or film negatives. In order to expose the desired pattern, it is necessary to precisely contr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F9/00
CPCG03F7/70383G03F7/70775G03F9/7076Y02P70/50
Inventor 刘栋张雷
Owner SUZHOU YUANZHUO OPTOELECTRONICS TECH CO LTD