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A high-efficiency processing method and device for diamond micropowder

A technology of diamond micropowder and processing method, which is applied in the direction of metal material coating process, coating, gaseous chemical plating, etc., can solve the problem of inability to eliminate micropowder impurities and the like

Active Publication Date: 2020-10-02
UNIV OF SCI & TECH BEIJING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method utilizes the crushing principle of direct collision and grinding between high-speed moving particles, and the particle shape of the obtained diamond powder can be close to a spherical shape without reshaping, which can make the particle shape of the diamond powder closer to a spherical shape , however, this method cannot eliminate the accompanying impurities in the micropowder

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  • A high-efficiency processing method and device for diamond micropowder

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Experimental program
Comparison scheme
Effect test

specific Embodiment approach 1

[0057] (1) Close the vacuum valve between the plasma processing chamber and the heating tube cavity and the cooling tube cavity, and place the molybdenum sample holder containing diamond micropowder on the deposition platform. Slowly feed argon as the main atmosphere, and open the chamber for vacuum suction, and slowly evacuate to a chamber pressure of 900Pa and maintain it. Set the excitation power at 600W and turn on the microwave power to excite the plasma. (2) Slowly feed hydrogen in an amount of 10% of the amount of argon, and oxygen in an amount of 1% of the amount of argon into the processing chamber. Gradually increase the microwave power to 1.5kW, adjust and control the cavity pressure at 7kPa, and make the temperature of the diamond powder reach 600°C. (3) Turn on the ultrasonic generator located at the lower part of the deposition table to promote the vibration and mutual collision of the diamond powder, and apply a negative bias voltage of -150V to the deposition ...

specific Embodiment approach 2

[0059] (1) Close the vacuum valve between the plasma processing chamber and the heating tube cavity and the cooling tube cavity, and place the molybdenum sample holder containing diamond micropowder on the deposition platform. Slowly feed argon gas as the main atmosphere, and open the chamber for vacuum suction, and slowly evacuate to the chamber pressure at 1kPa and maintain it. Set the excitation power at 700W and turn on the microwave power to excite the plasma. (2) Slowly feed hydrogen in an amount of 30% of the amount of argon gas, and oxygen in an amount of 5% of the amount of argon gas into the processing chamber. Gradually increase the microwave power to 3kW, adjust and control the chamber pressure at 15kPa, and make the temperature of the diamond powder reach 800°C. (3) Turn on the ultrasonic generator located at the lower part of the deposition table to promote the vibration and mutual collision of the diamond powder, and apply a negative bias voltage of -200V to th...

specific Embodiment approach 3

[0061](1) Close the vacuum valve between the plasma processing chamber and the heating tube cavity and the cooling tube cavity, and place the molybdenum sample holder containing diamond micropowder on the deposition platform. Slowly feed argon gas as the main atmosphere, and open the chamber for vacuum pumping, and slowly evacuate to a chamber pressure of 1.2kPa and maintain it. Set the excitation power at 700W and turn on the microwave power to excite the plasma. (2) Slowly feed hydrogen in an amount of 50% of the amount of argon gas, and oxygen in an amount of 5% of the amount of argon gas into the processing chamber. Gradually increase the microwave power to 4kW, adjust and control the chamber pressure at 20kPa, and make the temperature of the diamond powder reach 900°C. (3) Turn on the ultrasonic generator located at the lower part of the deposition table to promote the vibration and mutual collision of the diamond powder, and apply a negative bias voltage of -300V to the...

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Abstract

The invention discloses a high-efficiency treatment method and device for diamond micro-powder, and belongs to the technical field of diamond machining. The method is characterized in that the diamondmicro-powder preheated by 600 DEG C to 900 DEG C is placed on a deposition table in a chamber of a microwave plasma chemical vapor deposition system through a conveying and placing device under a vacuum condition. After uninterrupted argon, hydrogen and oxygen mixed plasma is subject to etching treatment at 600 DEG C to 900 DEG C, ultrasonic waves and negative bias voltage assistance are appliedat the same time, so that diamond micro-powder particles collide with each other, the diamond micro-powder is promoted to be uniformly etched by the plasma, irregular bulges on the surface of the diamond particles and impurities such as non-diamond phase in the micro-powder are fully eliminated, and spheroidal and pure diamond micro-powder is obtained. And the treated diamond micro-powder is takenout under the vacuum condition through a conveying and taking-out device on the other side, and synchronously cooling is carried out. Meanwhile, the next batch of diamond micro-powder is conveyed andthe processing processes are repeated, so that the continuous high-efficiency treatment of the pure and uniform spheroidal diamond micro-powder particles is realized.

Description

Technical field: [0001] The invention relates to the field of diamond processing and technology, in particular, the diamond micropowder preheated at 600°C to 900°C is transported and placed on a deposition platform in a chamber of a microwave plasma chemical vapor deposition system through a conveying and placing device under vacuum conditions. After uninterrupted argon, hydrogen and oxygen mixed plasma at 600°C to 900°C etching treatment, ultrasonic waves and negative bias voltage are applied at the same time to make the diamond powder particles collide with each other and promote the diamond powder to be uniformly etched by plasma , Fully eliminate irregular protrusions on the surface of diamond particles and non-diamond impurities in the powder, and obtain pure diamond powder in a spherical shape. Then, the treated diamond powder is taken out under vacuum condition and cooled synchronously through the conveying and taking out device on the other side. At the same time, tra...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/02C23C16/44C23C16/511
CPCC23C16/0245C23C16/4417C23C16/511
Inventor 李成明郑宇亭刘金龙魏俊俊陈良贤
Owner UNIV OF SCI & TECH BEIJING