Laser spectrum online measurement device and method

Abstract

The invention discloses a laser spectrum online measurement device and method, and the device comprises a first optical path assembly and a second optical path assembly, wherein the second optical path assembly and the first optical path assembly form a measurement optical path. The second light path assembly comprises an FP etalon and a grating, and the homogenized laser beam passes through the FP etalon to generate interference fringes; and the grating is arranged behind the FP etalon in the measurement light path and is used for carrying out dispersion processing on the laser beam passing through the FP etalon. According to the invention, the FP etalon and the grating are connected in series in a measurement light path; the high-precision measurement of a laser beam center wavelength ina wide range and accurate measurement of spectral parameters of a corresponding line width and E95 are realized, and a measurement light path is free of moving elements; the structure is simple and compact, the measurement precision is high, the stability is high, a corresponding measurement algorithm is simple and efficient, and the method has extremely high scientific research or commercial application value.

Description

technical field [0001] The invention relates to the technical field of spectrum measurement, in particular to a laser spectrum online measurement device and method. Background technique [0002] In the field of semiconductor chip processing, as the requirements for the feature size of IC chips are getting smaller and smaller, the performance requirements for lithography machines are getting higher and higher. Small, from the original 365nm mercury lamp to 248nm and 193nm excimer laser light source, and 13.5nm EUV light source. Among them, excimer laser is the most widely used light source in the field of semiconductor chip processing because of its large energy, narrow line width, short wavelength and high efficiency. For example, KrF excimer laser and ArF excimer laser are commonly used, and the center wavelength is 248nm respectively and 193nm. [0003] During the exposure process of the lithography machine, the spectral parameters such as the center wavelength, line wid...

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Problems solved by technology

[0010] In order to solve the technical problems in the prior art that the optical path structure used in laser spectrum measurement is too complicated, the volume is too large, the cost is too high, the amount of calculation is too large, and the operation stability is too poor, the invention discloses an online laser spectrum measurement device and its method

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