An image quality compensation device, optical system and lithography machine

A compensation device and image quality technology, applied in the field of lithography, can solve the problems of generalization and batch production and use of unfavorable image quality compensation devices, complex structure of fine-tuning mechanism, and difficulty in manufacturing, so as to achieve simple structure, lower cost, and simplified structure effect

Active Publication Date: 2021-04-30
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
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  • Claims
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Problems solved by technology

In the optical system image quality compensation device provided by the prior art, the structure of the fine-tuning mechanism is complicated, the manufacture is difficult, the cost is high, and the adjustment is troublesome, which is not conducive to the generalization and mass production and use of the image quality compensation device

Method used

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  • An image quality compensation device, optical system and lithography machine
  • An image quality compensation device, optical system and lithography machine
  • An image quality compensation device, optical system and lithography machine

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Embodiment Construction

[0059] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

[0060] figure 1 Schematic diagram of the structure of the image quality compensation device provided by the embodiment of the present invention, such as figure 1 As shown, the present embodiment provides an image quality compensating device, which is used to fine-tune the surface shape of the deformable mirror 4, thereby compensating the image quality of the deformable mirror 4 and the optical system where the deformable mirror 4 is located, and improving the shape of the deformable mirror 4 and the optical system...

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Abstract

The invention belongs to the technical field of photolithography, and specifically discloses an image quality compensation device, an optical system and a photolithography machine. Wherein, the image quality compensation device includes: a mirror base, the mirror base includes an annular adjustment base, the inner wall of the adjustment base is used to connect the deformable mirror, and the outer wall of the adjustment base is provided with a plurality of adjustment bosses at intervals in the circumferential direction The fine-tuning mechanism can drive the adjustment boss to move along the axial direction of the adjustment seat; the constraint part is arranged between two adjacent adjustment bosses, and the constraint part is connected to the outer wall of the adjustment seat , used to limit the movement of the adjustment seat. The optical system includes the above-mentioned image quality compensation device, and the photolithography machine includes the above-mentioned optical system. The image quality compensation device, optical system and lithography machine provided by the invention have simple structure, convenient adjustment and low cost.

Description

technical field [0001] The invention relates to the technical field of photolithography, in particular to an image quality compensation device, an optical system and a photolithography machine. Background technique [0002] As the core component of the lithography machine, the projection objective lens is one of the most sophisticated and complex optical systems in modern times. With the development of the miniaturization of integrated circuits, while the size of the chip continues to shrink, higher requirements are put forward for the wave aberration index of the projection objective lens. Research and development of lithographic projection objective lens with good image quality compensation ability has become one of the research hotspots at home and abroad. [0003] The active deformable mirror group compensates the aberration of the optical system through the change of its own lens surface shape, and is widely used in various lithography projection objectives. There are ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B26/08G03F7/20
CPCG02B26/0825G03F7/70266
Inventor 杨若霁王彦飞姜文庆
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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