Pupil evaluation method and system and electronic device

Abstract

The invention relates to a pupil evaluation method and system and an electronic device. The invention discloses a pupil evaluation method and system. The method comprises: based on a generated test pattern set and an optical model corresponding to a pupil to be evaluated, obtaining the key graph meeting the expected requirement, and the relation among the X-direction unbalance degree, the Y-direction unbalance degree, the ovality value and the photoetching performance matched with the corresponding pupil to be evaluated can be established through simulation processing, so that the visual understanding of the influence of pupil parameters on the photoetching performance can be provided. According to the invention, by obtaining the optical model matched with the pupil to be evaluated, the corresponding test pattern can be simulated for the pupil to be evaluated, and based on the test pattern obtained by screening, the X-direction unbalance degree, the Y-direction unbalance degree and theovality corresponding to the pupil to be evaluated can be further obtained.

Description

【Technical field】 [0001] The invention relates to the technical field of photolithography, and in particular, the invention relates to a pupil evaluation method, a system thereof, and an electronic device. 【Background technique】 [0002] The photolithography process is the most important manufacturing process in the modern ultra-large-scale integrated circuit manufacturing process, that is, an important means to transfer the design pattern of the integrated circuit on the mask to the silicon wafer through the photolithography machine. As the feature size gradually shrinks, the process window available for manufacturing becomes smaller and smaller, and the entire lithography process needs to be precisely controlled, which poses more stringent challenges to the hardware and software of each part of the lithography process, such as the pupil , aberrations, vibration levels such as mask tables and workpiece tables, etc. [0003] However, due to the flaws of hardware manufacturi...

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Problems solved by technology

[0003] However, due to the flaws of hardware manufacturing, there will be no ideal perfectly symmetrical pupil in practice. Usually, the pupil will have a certain degree of unbalance. The existing pupil unbalance is a numerical value, which is difficult to give Intuitive understanding, such as how much error it causes to the actual lithography process, and it is difficult to give an intuitive reference value for the influence of the pupil on the lithography performance

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