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A liquid cooling radiator and communication equipment

A heat sink and liquid cooling technology, which is applied to the structural parts of electrical equipment, semiconductor devices, electric solid devices, etc., can solve the problems of complex flow channel design methods

Active Publication Date: 2022-05-10
HUAWEI DIGITAL POWER TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when there are multiple heat sources for the liquid-cooled radiators designed by these two design methods, the design method of the flow channel is relatively complicated.

Method used

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  • A liquid cooling radiator and communication equipment
  • A liquid cooling radiator and communication equipment
  • A liquid cooling radiator and communication equipment

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Embodiment Construction

[0030] In order to make the purpose, technical solution and advantages of the application clearer, the application will be further described in detail below in conjunction with the accompanying drawings.

[0031] First, let’s explain the application scenarios of the heat sink. The heat sink provided in the embodiment of this application is used to dissipate heat for high-power semiconductor devices. With the development of current electronic equipment, there are more and more high-power devices in electronic equipment. requirements are also getting higher. In addition, with the development of miniaturization and integration of current electronic equipment, the space left for heat dissipation components is getting smaller and smaller. Therefore, the heat dissipation capability of high-power semiconductor devices under high power density needs to be improved urgently. To this end, an embodiment of the present application provides a heat dissipation device, which is used to impro...

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Abstract

The present application provides a liquid-cooled radiator and a communication device. The liquid-cooled radiator includes a housing on which at least two heat dissipation areas arranged along a fluid flow direction are arranged. The heat dissipation requirements of the heat sources provided in each heat dissipation area are different, and fluid channels corresponding to each heat dissipation area are provided in the casing. In order to facilitate the flow of fluid and meet the different requirements for flow in different heat dissipation areas, the liquid cooling radiator provided in the present application is provided with a redistribution module between at least two adjacent fluid channels. The fluids of the fluid channels located upstream of the redistribution module are combined by the redistribution module, and the combined fluids are diverted to the fluid channels located downstream by the redistribution module. It can be seen from the above description that the fluid in the upstream fluid channel is merged through the redistribution module, and the entire stream of fluid after the confluence is redistributed to the downstream heat dissipation area, so that the areas with different heat dissipation requirements in the downstream heat dissipation area The corresponding traffic can be provided.

Description

technical field [0001] The present application relates to the technical field of heat dissipation, and in particular to a liquid-cooled radiator and communication equipment. Background technique [0002] At present, the power density of semiconductor devices is increasing, and there are not only many heating wafers, but also concentrated in the adjacent area. This requires liquid cooling radiators to have high heat dissipation efficiency, and can dissipate heat for different positions and different heat sources. Each heat source The temperature difference between them also needs to be maintained within a certain reasonable range. [0003] When existing liquid-cooled radiators dissipate heat for high-power semiconductor devices, the flow channels are not optimized for the differences in wafer distribution and heat loss. This will lead to a large temperature difference between the high heat flux wafer temperature inside the device and the low heat flux wafer, and may also cau...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L23/34H01L23/367H01L23/473
CPCH01L23/473H01L23/34H01L23/367H01L23/3672H05K7/20927
Inventor 叶文陈君李泉明
Owner HUAWEI DIGITAL POWER TECH CO LTD
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