Analysis method, liquid medicine, and method for manufacturing liquid medicine
An analysis method and liquid medicine technology, applied in the direction of analysis of materials, preparation of test samples, material analysis using wave/particle radiation, etc., can solve the problem of reducing the production yield of semiconductor substrates, and achieve the effect of easy measurement results
Active Publication Date: 2020-09-15
FUJIFILM CORP
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Problems solved by technology
Metal impurities adhering to the substrate are considered to cause defects, and as a result, become one of the factors that reduce the manufacturing yield of semiconductor substrates
Method used
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Embodiment
[0322]Hereinafter, the present invention will be described in further detail based on examples. Materials, usage amounts, ratios, processing contents, processing procedures, and the like shown in the following examples can be appropriately changed without departing from the gist of the present invention. Therefore, the scope of the present invention should not be limitedly interpreted by the Examples shown below.
[0323] In addition, when manufacturing the liquid medicine containers of Examples and Comparative Examples, the handling of the container, preparation, filling, storage, and analysis and measurement of the liquid medicine meet Level 2 specified in the international standard ISO14644-1:2015 stipulated by the International Organization for Standardization. Above cleanliness is performed in a clean room.
[0324] Before use, the containers used in the examples were thoroughly washed with the following ultrapure water and / or stored solvents.
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Abstract
The present invention addresses the problem of providing an analysis method whereby an accurate measurement result can easily be obtained even when a substrate is coated with a specimen (in particular, a specimen having a low content of a metal impurity) and the amount of the metal impurity per unit area on the substrate is measured, a liquid medicine, and a method for manufacturing a liquid medicine. This analysis method has a step A for concentrating, at a predetermined factor, a specimen containing at least one type of organic solvent and a metal impurity containing metal atoms, a step B for coating a substrate with the specimen and obtaining a coated substrate, and a step C for measuring the number of metal atoms per unit area on the coated substrate and obtaining a measurement value using a total reflection fluorescence X-ray analysis method.
Description
technical field [0001] The invention relates to an analysis method, a medicinal liquid and a manufacturing method of the medicinal liquid. Background technique [0002] In the manufacturing process of a semiconductor substrate, metal impurities containing metal atoms may adhere to the substrate. It is considered that metal impurities adhering to the substrate cause defects, and as a result, become one of the factors that lower the manufacturing yield of semiconductor substrates. In recent years, the wiring width and pitch have been further narrowed, and this tendency has become more prominent. In particular, with regard to chemical solutions used when forming wiring by photolithography, as a result of making metal impurities less likely to adhere to the substrate, performance that is less likely to cause defects (hereinafter, also referred to as "defect suppression performance") is strongly required. . [0003] As a method for measuring the presence or absence of metal im...
Claims
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IPC IPC(8): G01N23/223G01N23/2202
CPCG01N23/2202G01N23/223G01N33/20G01N1/2813C07C67/48C07C231/24C07F9/09G01N1/38G01N1/40G21K1/06G03F7/32G03F7/0048
Inventor 上村哲也
Owner FUJIFILM CORP