MOCVD (Metal Organic Chemical Vapor Deposition) combined spray header and MOCVD equipment

Abstract

The invention discloses an MOCVD (Metal Organic Chemical Vapor Deposition) combined spray header. The MOCVD combined spray header comprises a fixed rail and a plurality of single reaction source sprayheaders, the fixed rail is used for fixing the plurality of single reaction source spray heads; the single reaction source spray header comprises a maneuvering assembly, a diffusion cavity, a gas conveying pipe and a nozzle array; reaction gas enters the diffusion cavity through the gas conveying pipe, is diffused in the diffusion cavity and then reaches the surface of a substrate to be depositedthrough the nozzle array. And the single reaction source spray header is connected to the fixed track through the maneuvering assembly and moves along the fixed track in the direction perpendicular to the surface of the substrate to be deposited through the maneuvering assembly. According to the method, the flow field in the MOCVD reaction cavity is regulated and controlled, the reaction progressof different types of reactions is controlled, and the uniformity and quality of the multi-component alloy film grown by MOCVD are improved. The invention also provides the MOCVD equipment with the above beneficial effects at the same time.

Description

technical field [0001] The invention relates to the field of metal chemical vapor deposition, in particular to an MOCVD combined shower head and MOCVD equipment. Background technique [0002] Metal Organic Chemical Vapor Deposition (MOCVD) is a new type of vapor phase epitaxy growth technology for preparing compound single crystal thin films, which was put into practical use in the early 1980s. After decades of rapid development, MOCVD has become one of the key technologies for the preparation of semiconductor compound materials, and is widely used in the preparation of semiconductor optoelectronics and microelectronic devices. [0003] In MOCVD technology, in order to grow semiconductor thin film materials with high crystal quality, uniform thickness and composition, it is necessary not only to suppress the pre-reaction, but also to make the concentration of the reactants reaching the substrate as uniform as possible. At present, the mainstream commercial MOCVD equipment f...

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a MOCVD combined shower head and MOCVD equipment to solve the problem of poor uniformity of multi-element alloy growth in MOCVD equipment in the prior art

Images