Method for generating metal grid layout of image sensor and metal grid photomask pattern

An image sensor, metal grid technology, applied in the direction of electric solid-state devices, semiconductor devices, electrical components, etc., can solve the problem of high cost

Pending Publication Date: 2020-10-27
SHANGHAI HUALI MICROELECTRONICS CORP
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Problems solved by technology

[0005] The object of the present invention is to provide a method for generating a metal grid layout of an image sensor and a metal grid mask pattern, so as to solve the problem of high cost when generating a metal grid layout of a special shape in the existing forming method

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  • Method for generating metal grid layout of image sensor and metal grid photomask pattern
  • Method for generating metal grid layout of image sensor and metal grid photomask pattern
  • Method for generating metal grid layout of image sensor and metal grid photomask pattern

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Embodiment Construction

[0040] The specific implementation manner of the present invention will be described in more detail below with reference to schematic diagrams. The advantages and features of the present invention will be more apparent from the following description. It should be noted that all the drawings are in a very simplified form and use imprecise scales, and are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention.

[0041] As mentioned in the background technology, in the current generation method of the special-shaped metal grid layout of the image sensor, the layout design engineer needs to use the layout drawing software that mainly supports standard graphics to draw through complicated drawing operation steps, therefore, This increases the design time and cost of layout design engineers, reduces the efficiency of layout design and generation, and makes it inconvenient to realize the diversity of layouts during the research...

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Abstract

The invention provides a method for generating a metal grid layout of an image sensor and a metal grid photomask pattern. The generation method comprises the steps that data information of an originalmetal grid layout is acquired, a first metal grid layout is drawn, the first metal grid layout comprises a plurality of metal grids, and each metal grid is a right-angle rectangle; and on the basis of a layout operation rule in a layout logical operation file, logical operation is carried out on the first metal grid layout to obtain a second metal grid layout, and the corner shape of each metal grid in the second metal grid layout is a polygonal corner or a rounded corner. On the basis of a metal grid layout with rectangular metal grids, a series of layout logic operations are carried out onthe metal grids to generate a metal grid layout with special-shaped corners; and therefore, a layout design engineer does not need to manually draw a complex metal grid layout with a special shape, sothat the layout design and generation efficiency is improved, and the layout design cost is reduced.

Description

technical field [0001] The invention relates to the technical field of integrated circuit manufacturing, in particular to a method for generating a metal grid layout of an image sensor and a pattern of a metal grid mask. Background technique [0002] At present, in the manufacturing process of CMOS image sensors, after the incident light is captured by the microlens, it is filtered by the filter mirror to remove irrelevant light and form monochromatic light. The incident light reaches the semiconductor substrate and is absorbed by it to generate photogenerated current. son. Currently, before the incident light reaches the semiconductor substrate, optical crosstalk occurs, which affects the imaging effect. In order to reduce the optical crosstalk of the incident light received by the CMOS image sensor device, it is necessary to form a metal grid (Metal Grid) on the surface of the semiconductor substrate to isolate the incident light. [0003] With the development of the ima...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/146
CPCH01L27/14643H01L27/14683H01L27/14605
Inventor 丁琦杨婷
Owner SHANGHAI HUALI MICROELECTRONICS CORP
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