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Semiconductor device and manufacturing method thereof

A manufacturing method and semiconductor technology, applied in the direction of semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve problems such as restricting the scope of application, and achieve the effect of good support strength and low cost

Pending Publication Date: 2020-10-30
GUANGDONG ZHINENG TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are many defects in the existing structure, which seriously restricts its application range.

Method used

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  • Semiconductor device and manufacturing method thereof
  • Semiconductor device and manufacturing method thereof
  • Semiconductor device and manufacturing method thereof

Examples

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Comparison scheme
Effect test

Embodiment Construction

[0037] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0038] In the following detailed description, reference is made to the accompanying drawings which are included in the specification and which illustrate specific embodiments of the application and which are included in this application. In the drawings, like reference numerals describe substantially similar components in different views. Va...

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PUM

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Abstract

The invention relates to a semiconductor device and a manufacturing method thereof. The semiconductor device includes a semiconductor device layer, a first electrode interconnection layer, one or morefirst metal columns, a first insulating material and a second electrode interconnection layer, wherein the semiconductor device layer includes one or more semiconductor devices; the first electrode interconnection layer is arranged on the first side of the semiconductor device layer; the one or more first metal columns is / are arranged on the first side of the semiconductor device layer and electrically connected with the first electrode interconnection layer; the first insulating material is arranged around the one or more first metal columns, and the first insulating material is an injectionmolding material; and the second electrode interconnection layer is arranged on a second side opposite to the first side of the semiconductor device layer. In the technical scheme of the invention, good support strength can be realized without a temporary substrate, related processes of a semiconductor manufacturing process are completed, and the semiconductor device is convenient and fast and islow in cost.

Description

technical field [0001] The invention relates to the field of semiconductor technology, in particular to a semiconductor device and a manufacturing method thereof. Background technique [0002] Group III nitride semiconductors are important semiconductor materials, mainly including AlN, GaN, InN and compounds of these materials such as AlGaN, InGaN, AlInGaN, etc. Due to the advantages of direct band gap, wide band gap, and high breakdown electric field strength, group III nitride semiconductors represented by GaN have broad application prospects in the fields of light-emitting devices, power electronics, and radio frequency devices. [0003] Unlike traditional non-polar semiconductor materials such as Si, Group III nitride semiconductors are polar, that is, polar semiconductor materials. Polar semiconductors have many unique properties. It is especially important that fixed polarization charges exist on the surface of polar semiconductors or at the interface of two differen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/778H01L29/06H01L21/335
CPCH01L29/7783H01L29/7789H01L29/66431H01L29/2003H01L29/7788H01L29/0657H01L29/41741H01L29/66462H01L29/872H01L29/0653H01L2224/06181H01L2224/94H01L2924/13064H01L2924/12032H01L24/06H01L2224/05647H01L2224/0384H01L24/05H01L24/03H01L2224/03002H01L2224/03H01L2924/00014H01L29/66212H01L29/41H01L21/78H01L21/7806
Inventor 黎子兰
Owner GUANGDONG ZHINENG TECH CO LTD
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