Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Anti-radiation common-island LPNP and SPNP layout structure

A technology of layout structure and radiation resistance, applied in the direction of electrical components, electric solid devices, circuits, etc., can solve the problems such as the decrease of the magnification of the SPNP tube, the decrease of the current collection capacity of the emission area, and the influence of the radiation resistance performance of the circuit, so as to save the layout. area, improve the anti-radiation performance, and stabilize the effect of the DC operating point

Active Publication Date: 2020-11-20
XIAN MICROELECTRONICS TECH INST
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the conventional anti-radiation common base LPNP and SPNP layout structures have the following disadvantages: 1) The base diffusion area as the collector area of ​​the SPNP tube does not completely surround the emitter area, which reduces the current collection ability of the emitter area and the magnification of the SPNP tube. , under the radiation environment, the further decrease of the magnification will affect the overall anti-radiation performance of the circuit; 2) There is a current channel between the SPNP emitter and the LPNP collector, such as figure 2 As shown in area A in the middle, when there is a defect on the surface of the device or the inversion of area A after radiation, it will cause a leakage channel between the SPNP and LPNP tubes, which will affect the normal use of the entire chip

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Anti-radiation common-island LPNP and SPNP layout structure
  • Anti-radiation common-island LPNP and SPNP layout structure
  • Anti-radiation common-island LPNP and SPNP layout structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Such as image 3 and Figure 4 As shown, a radiation-resistant common-island LPNP and SPNP layout structure of the present invention includes a base 11 of LPNP, a collector 12 of LPNP, an emitter 13 of LPNP, an emitter 21 of SPNP, a base compound wall 3, Substrate 4 , epitaxial layer channel resistance 5 and buried layer 6 .

[0030] The surface of the substrate 4 is covered with an N-type epitaxial layer, and a buried layer 6 is arranged between the N-type epitaxial layer and the substrate 4; the base 11 of the LPNP and the collector of the LPNP are sequentially arranged on the N-type epitaxial layer 12. The emitter 13 of LPNP, the base compound wall 3 and the emitter E21 of SPNP; the base 11 of LPNP is connected to one end (point A) of the epitaxial channel resistance 5 through the epitaxial layer, and the other end (point A) of the epitaxial channel resistance 5 ( Point B), connect the base of SPNP; the base compound wall 3 separates the common island LPNP and SPNP...

Embodiment 2

[0035] The radiation-resistant common-island LPNP and SPNP layout structure in Embodiment 1 can improve the radiation resistance performance, but there is a risk of pinch-off of the base region of the SPNP tube. There is an epitaxial layer channel resistance Repi between the SPNP and LPNP bases. In actual work, when the potential of the epitaxial layer (the base of LPNP and SPNP) rises, the depletion layer 7 between the composite wall P+ and the epitaxial layer will widen, the resistance channel will be narrowed, and the resistance will increase. When the resistance channel is sandwiched When it is off, the SPNP base is open circuit, and the SPNP will not work normally.

[0036] Such as Figure 5 As shown, when the voltages of A and B (the bases of LPNP and SPNP) are close to the wall voltage Vs- of the isolation wall 8, the depletion layer 7 is relatively narrow, and there is an N-type epitaxial resistance channel between A and B. As A, As the B node voltage rises, the widt...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

An anti-radiation common-island LPNP and SPNP layout structure comprises an LPNP base electrode, an LPNP collector electrode, an LPNP emitter electrode, an SPNP emitter electrode, a base region composite wall, a substrate, an epitaxial layer channel resistor and a buried layer. The surface of the substrate is covered with an epitaxial layer, and a buried layer is arranged between the epitaxial layer and the substrate; the LPNP base electrode, the LPNP collector electrode, the LPNP emitter electrode, the base region composite wall and the SPNP emitter electrode are arranged on the epitaxial layer; the LPNP and the SPNP which share the same island are separated by the base region composite wall to form an LPNP isolation island and an SPNP isolation island, and the LPNP isolation island and the SPNP isolation island are communicated through an epitaxial layer to form an epitaxial layer channel resistor; the base electrode B of the LPNP is connected with one end of the epitaxial channel resistor through the epitaxial layer, and the other end of the epitaxial channel resistor is connected with the base electrode of the SPNP. The current amplification factor of the SPNP is effectively improved, the anti-irradiation performance is improved, and the layout area is saved. The layout structure can be popularized and applied to layout design of any low-voltage anti-radiation bipolar circuit, the layout area of a chip is effectively reduced, and the anti-radiation performance is improved.

Description

technical field [0001] The invention relates to the technical field of integrated circuit bipolar circuit layout design, in particular to an anti-radiation common-island LPNP and SPNP layout structure. Background technique [0002] At present, bipolar circuits such as radiation-resistant precision operational amplifiers are widely used in aerospace, aviation and other fields. The miniaturization of circuit chips, the improvement of radiation resistance performance and work reliability are the necessary prerequisites to ensure the smooth completion of model tasks. The current application environment of precision operational amplifiers is becoming more and more complex, and the performance requirements for amplifiers are becoming more and more stringent. This requires the chip to meet the challenges of harsh application conditions on the premise of meeting the basic performance requirements, and often the conventional design structure is not enough to meet the requirements. ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/02
CPCH01L27/0207H01L27/0229
Inventor 钟咏梅刘鹏方雷尤路魏海龙
Owner XIAN MICROELECTRONICS TECH INST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products