Planetary sample table capable of realizing automatic turning

Abstract

The invention relates to the technical field of vacuum coating, and discloses a planetary sample table capable of realizing automatic turning. The technical scheme is characterized in that the planetary sample table comprises a bracket, wherein a heating area is arranged in the bracket, the heating area comprises a central rotating shaft and a plurality of heating parts, U-shaped grooves are respectively formed in both ends of the central rotating shaft, a substrate is placed on the heating parts, the substrate is heated by a heating plate, the distance between the heating area and the heatingplate can be adjusted by a first lifting assembly, so that the heating temperature is controlled; a rotating shaft is driven to move up and down by a second lifting assembly, so that U-shaped blocksare embedded into or separated from the U-shaped grooves; the central rotating shaft is driven to rotate by a rotating assembly, a motor does not need to be arranged in the heating area, so that the circumferential movement of the heating parts can be realized; and the heating area can be turned by a turning mechanism, so that the substrate is more uniformly heated, and the problem that the coating needs to be stopped under the condition that the double surfaces of the substrate are coated is avoided.

Description

technical field [0001] The invention relates to the technical field of vacuum coating, and more specifically relates to a planetary sample stage capable of automatic flipping. Background technique [0002] In the coating equipment, the uniformity of the film depends on the evaporation characteristics of the evaporation source, the geometry of the substrate, the relative position of the substrate and the evaporation source and other factors. The principle of relative movement between the substrate and the evaporation source is often used. The rotation of the substrate is the most practical method to obtain a uniform film. Change the temperature of the evaporation source, and manually turn over the substrate. After turning over, the original fixed position may be changed, resulting in the change of the state of the substrate when it is coated again. Therefore, it is difficult to ensure that the two sides of the substrate The uniformity and symmetry of the surface film layer. ...

AI Technical Summary

Problems solved by technology

The principle of relative movement between the substrate and the evaporation source is often used. The rotation of the substrate is the most practical method to obtain a uniform film. Change the temperature of the evaporation source, and manually turn over the substrate. After turning over, the original fixed position may be changed, resulting in the change of the state of the substrate when it is coated again. Therefore, it is difficult to ensure that the two sides of the substrate The uniformity and symmetry of the surface film layer

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