Planetary sample table capable of realizing automatic turning

A technology of automatic turning and sample stage, applied in the direction of ion implantation plating, metal material coating process, coating, etc., can solve the problem that it is difficult to ensure the uniformity and symmetry of the film layers on the two surfaces of the substrate, and achieve heating Uniform, easy to arrange and set up effects

Pending Publication Date: 2020-11-24
浙江赛威科光电科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The principle of relative movement between the substrate and the evaporation source is often used. The rotation of the substrate is the most practical method to obtain a uniform film. Change the temperature of the evaporation source, and manually turn over the substrate

Method used

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  • Planetary sample table capable of realizing automatic turning
  • Planetary sample table capable of realizing automatic turning
  • Planetary sample table capable of realizing automatic turning

Examples

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Example Embodiment

[0025] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments. Wherein the same components are denoted by the same reference numerals. It should be noted that the words "front", "rear", "left", "right", "upper" and "lower" used in the following description refer to the directions in the drawings, and the words "bottom" and "top "Face", "inner" and "outer" refer to directions toward or away from, respectively, the geometric center of a particular component.

[0026] refer to Figure 1 to Figure 9As shown, a planetary sample stage that realizes automatic flipping in this embodiment includes a support 1, and a heating area 11 is arranged in the support 1. The heating area 11 includes a central rotating shaft 12 and several heating parts 13, and the substrate is placed on On the heating part 13, U-shaped grooves 121 are opened at both ends of the central rotating shaft 12, and a through hole 14 is opened on t...

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Abstract

The invention relates to the technical field of vacuum coating, and discloses a planetary sample table capable of realizing automatic turning. The technical scheme is characterized in that the planetary sample table comprises a bracket, wherein a heating area is arranged in the bracket, the heating area comprises a central rotating shaft and a plurality of heating parts, U-shaped grooves are respectively formed in both ends of the central rotating shaft, a substrate is placed on the heating parts, the substrate is heated by a heating plate, the distance between the heating area and the heatingplate can be adjusted by a first lifting assembly, so that the heating temperature is controlled; a rotating shaft is driven to move up and down by a second lifting assembly, so that U-shaped blocksare embedded into or separated from the U-shaped grooves; the central rotating shaft is driven to rotate by a rotating assembly, a motor does not need to be arranged in the heating area, so that the circumferential movement of the heating parts can be realized; and the heating area can be turned by a turning mechanism, so that the substrate is more uniformly heated, and the problem that the coating needs to be stopped under the condition that the double surfaces of the substrate are coated is avoided.

Description

technical field [0001] The invention relates to the technical field of vacuum coating, and more specifically relates to a planetary sample stage capable of automatic flipping. Background technique [0002] In the coating equipment, the uniformity of the film depends on the evaporation characteristics of the evaporation source, the geometry of the substrate, the relative position of the substrate and the evaporation source and other factors. The principle of relative movement between the substrate and the evaporation source is often used. The rotation of the substrate is the most practical method to obtain a uniform film. Change the temperature of the evaporation source, and manually turn over the substrate. After turning over, the original fixed position may be changed, resulting in the change of the state of the substrate when it is coated again. Therefore, it is difficult to ensure that the two sides of the substrate The uniformity and symmetry of the surface film layer. ...

Claims

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Application Information

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IPC IPC(8): C23C14/50C23C14/24C23C14/54
CPCC23C14/24C23C14/505C23C14/541
Inventor 金炯杨林王福清
Owner 浙江赛威科光电科技有限公司
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