Unlock instant, AI-driven research and patent intelligence for your innovation.

High voltage ESD structure

A high-voltage, MOS tube technology, applied in the direction of electrical components, electrical solid-state devices, circuits, etc., can solve the problems of weak anti-ESD ability and unsuitable application occasions

Active Publication Date: 2020-11-24
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The drain region is located in the central area of ​​the layout, and the anti-ESD ability of the device with this structure is relatively weak, only 500V, which cannot meet some applications with higher ESD requirements

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High voltage ESD structure
  • High voltage ESD structure
  • High voltage ESD structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] High voltage ESD structure of the present invention, refer to as figure 1 In the structure shown, its plane layout is a left-right symmetrical rounded rectangular MOS transistor structure, wherein the drain region of the MOS transistor is located in the central area of ​​the rounded rectangle, and the polysilicon gate is surrounded by a rounded rectangular shape. The present invention is aimed at figure 1 The layout structure shown is adjusted, mainly for such as figure 1 The four areas A, B, C, and D shown in .

[0028] On the top view plane, the rounded rectangle is divided into top rounded corners (A region) and bottom rounded corners (D region). In the arc-shaped region with rounded corners at the top, there are heavily doped N-type regions and heavily doped P-type regions, which are parallel to each other and are in contact with each other. refer to figure 2 and image 3 Partial enlarged view of area A of figure 2 is the traditional structure, image 3 It ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a high-voltage ESD structure which is an MOS tube structure with a rounded rectangle-shaped planar layout. The high-voltage ESD structure comprises a drain region, wherein thedrain region is positioned in a central region of the rounded rectangle; the rounded rectangle is divided into top rounded corners and bottom rounded corners on an overlooking plane; a heavily-doped N-type region and a heavily-doped P-type region are arranged in the arc-shaped region of each top round corner, are parallel to each other and are in abutting contact with each other; the drain regionis divided into a top drain region and a bottom drain region, the top drain region comprises a contact region, and the boundary of an active region is located outside the contact region and spaced from the contact region by a certain distance; the bottom drain region comprises a heavily doped N-type injection region, and the width of the heavily doped N-type injection region is smaller than that of the active region; contact holes are not formed in the drain region at the bottommost end, and the drain region close to the central region has two columns of contact holes; and in the bottom roundcorner region, the heavily doped N-type region abuts against and contacts with the heavily doped P-type region, and the heavily doped N-type region overlaps with the boundary of the active region. Thehigh-voltage ESD structure can improve the ESD capability.

Description

technical field [0001] The invention relates to the field of design and manufacture of semiconductor devices, in particular to a high-voltage ESD structure. Background technique [0002] Static electricity is an objective natural phenomenon, which can be produced in many ways, such as contact, friction, induction between electrical appliances, etc. Static electricity is characterized by long-term accumulation, high voltage, low power, small current and short action time. Static electricity causes serious harm in many fields. Friction electrification and human body static electricity are two major hazards in the electronics industry, which often cause unstable operation or even damage of electronic and electrical products. [0003] As the feature size of the semiconductor integrated circuit manufacturing process becomes smaller and smaller, the size of the chip unit is also smaller and smaller, and the antistatic ability of the chip becomes more and more important. The des...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/02
CPCH01L27/0251H01L27/0207
Inventor 韦敏侠
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP