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Pneumatic support device and lithographic apparatus with pneumatic support device

A technology for pneumatic support and lithography equipment, which can be used in microlithography exposure equipment, optomechanical equipment, photolithography process exposure devices, etc., and can solve problems such as overlapping errors

Pending Publication Date: 2020-12-04
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This deformation or displacement can cause overlay errors

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  • Pneumatic support device and lithographic apparatus with pneumatic support device
  • Pneumatic support device and lithographic apparatus with pneumatic support device
  • Pneumatic support device and lithographic apparatus with pneumatic support device

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Embodiment Construction

[0034] In this document, the terms "radiation" and "beam" are used to cover all types of electromagnetic radiation, including ultraviolet radiation (e.g. at wavelengths of 365, 248, 193, 157 or 126 nm) and EUV (extreme ultraviolet radiation, e.g. at in the range of 5 to 100 nm).

[0035] The terms "reticle", "mask" or "patterning device" as used herein may be broadly interpreted to refer to a general patterning device that can be used to impart a patterned cross-section to an incident radiation beam, the patterned The cross section of corresponds to the pattern to be formed in the target portion of the substrate. The term "light valve" can also be used in this context. In addition to classical masks (transmissive or reflective, binary masks, phase shift masks, hybrid masks, etc.), examples of other such patterning devices include programmable mirror arrays and programmable LCD arrays.

[0036] figure 1 A lithographic apparatus LA is schematically depicted. The lithographi...

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PUM

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Abstract

The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configuredfor positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, apressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit. The control unit is configured to: receive the first sensor signal, receive the second sensor signal, filter the first sensor signal in a low-pass filter, filter the second sensor signal in a high-pass filter, determine, based on the filtered first sensor signal and filtered second sensor signal, a force exerted by the suspending part on the suspended part, and generate, based on said force, a control signal for the actuator.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from European Application 18169148.6, filed 25 April 2018, which is hereby incorporated by reference in its entirety. technical field [0003] The invention relates to a pneumatic support for a lithographic apparatus and an assembly comprising such a support and a lithographic apparatus. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern to a substrate. For example, lithographic equipment can be used in the fabrication of integrated circuits (ICs). For example, a lithographic apparatus may project a pattern (also often referred to as a "design layout" or "design") of a patterning device (such as a mask) onto a radiation-sensitive material (resist) disposed on a substrate (such as a wafer). agent) layer. [0005] As semiconductor manufacturing processes continue to advance, the size of circuit elements has continued to decrease, while t...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/70816G03F7/709
Inventor H·巴特勒J·S·德比尔C·A·L·德胡恩J·P·斯塔雷维尔德M·范杜伊恩霍芬M·W·J·E·维杰克曼斯
Owner ASML NETHERLANDS BV