Informatics calculation photoetching method

Abstract

The invention provides an informatics calculation photoetching method, which comprises the following steps of: firstly, establishing a calculation photoetching channel model according to an information theory, then solving optimal mask distribution, optimal photoetching system parameters and process parameters under the information theory, and finally, improving the convergence precision of a calculation photoetching algorithm by adopting the information theory. Therefore, the essence of the method is that a channel model is used for depicting a photoetching system, a photoetching imaging process is abstracted into a channel transmission process, a mask pattern and photoetching imaging are regarded as input and output signals of a channel, and photoetching system parameters, photoetching process parameters and the like are regarded as channel parameters influencing photoetching layout information transmission; the calculation photoetching is adopted to optimize the mask, which is equivalent to the encoding process of the signal; that is to say, an informatics model for calculating photoetching is established, a photoetching pattern information transmission mechanism and rule are researched through adoption of a mathematical method, the theoretical limit for calculating photoetching imaging precision can be obtained, and the convergence precision of a calculation photoetching algorithm is improved.

Description

technical field [0001] The invention belongs to the field of microelectronics manufacturing and information technology, and in particular relates to an informatics calculation photolithography method. Background technique [0002] Photolithography is a key technology in the manufacture of integrated circuits. The photolithography system uses a short-wavelength light source to irradiate the mask, on which the circuit pattern to be printed is pre-recorded. After the light passes through the mask, it is collected by the projection objective lens and projected onto the silicon wafer coated with photoresist. After exposure, development, etching and other processes, the circuit pattern is reproduced on the silicon wafer. [0003] However, the etching accuracy of a lithography system will be affected by light diffraction, interference, and other optical effects and process variations. For this reason, the integrated circuit industry widely adopts computational lithography technol...

AI Technical Summary

Problems solved by technology

However, researchers are still unclear about the informatics nature of computational lithography and the transmission mechanism of lithography layout information in the framework of computational lithography, and the theoretical limit of the imaging accuracy of lithography systems that computational lithography algorithms can achieve clear

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