Nanoimprint device and method capable of preparing super-hydrophobic microstructure

Abstract

The invention relates to a nanoimprint device and method capable of preparing a super-hydrophobic microstructure. The nanoimprint method comprise the steps of firstly, evenly smearing imprint glue benzyl mercaptan palladium on the surface of a first substrate and the surface of a second substrate through a first gluing device and a second gluing device; then respectively imprinting the substrate Iand the substrate II by an imprinting device I and an imprinting device II to obtain a substrate I with a longitudinal grating structure and a substrate II with a transverse grating structure, and carrying out high-temperature treatment on the substrate I for one hour to convert the benzyl mercaptan palladium grating into a metal palladium grating; and separating the transverse grating from the substrate II under the action of an imprinting device III, adhering the transverse grating to the longitudinal grating to form a stacked structure, and performing high-temperature treatment for one hour to convert the transverse benzyl mercaptan palladium grating into a metal palladium grating, thereby obtaining the super-hydrophobic microstructure. According to the method, the super-hydrophobic microstructure is prepared by using roller-to-roller imprinting and a method of combining nano imprinting and chemistry, so that a composite structure can be easily prepared, the substrate is preventedfrom being taken and placed for multiple times, the preparation time and the alignment error are reduced, and the cost is greatly reduced.

Description

technical field [0001] The invention relates to the field of nanoimprinting, in particular to a nanoimprinting device and method capable of preparing superhydrophobic microstructures. Background technique [0002] Compared with traditional lithography technology, nanoimprint technology has the advantages of low cost, high output and simple process, and has become a hot topic in universities and research institutions. The principle is to engrave the nano-microstructure complementary to the microstructure on the template on the imprinting glue by means of nano-imprinting, and then use chemical etching to process the engraved nano-microstructure, and finally produce into semiconductor materials with nanostructures. [0003] At present, nanoimprinting technology can be divided into three categories: thermal embossing technology, ultraviolet imprinting technology and micro-contact printing technology. The present invention mainly adopts thermal embossing technology to prepare su...

AI Technical Summary

Problems solved by technology

However, this preparation method still has some shortcomings. This method is prepared by chemical methods. Compared with the preparation by nanoimprinting method, the preparation process of this method is too complicated and time-consuming, and the second is that it is difficult to prepare composite structures.

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