Machine table for wafer cleaning machine
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 上海宏轶电子科技有限公司
- Publication Date
- 2021-02-02
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Abstract
Description
technical field
[0001] The invention relates to the technical field of wafer production equipment, in particular to a wafer cleaning machine platform. Background technique
[0002] Wafer refers to the silicon wafer used in the production of silicon semiconductor integrated circuits. Because of its circular shape, it is called a wafer. The raw material of the wafer is silicon, and the surface of the earth's crust has an inexhaustible amount of silicon dioxide. Silica ore is refined in an electric arc furnace, chlorinated with hydrochloric acid, and distilled to produce high-purity polysilicon. Silicon is refined from quartz sand, and the wafer is purified by silicon elements. Then these pure silicon are made into silicon crystal rods, which become the material of quartz semiconductors for manufacturing integrated circuits. After photolithography, grinding, polishing, and slicing Waiting for the procedure, the polysilicon is melted and pulled out of the monocrystalline silic...