Semiconductor memory device and manufacturing method thereof
A technology for storage devices and manufacturing methods, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, semiconductor/solid-state device components, etc., and can solve the problem of long transmission paths of non-volatile memory chips, bandwidth limitations of chip interface transmission lines, and data interaction Speed limitation and other issues, to achieve the effect of reducing the length of the I/O connection, saving the circuit area, and reducing the area
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[0035] A specific implementation of a semiconductor storage device and a manufacturing method thereof provided by the present invention will be described in detail below with reference to the accompanying drawings.
[0036] Please refer to FIG. 1 , which is a schematic structural diagram of a semiconductor storage device according to an embodiment of the present invention.
[0037] The semiconductor storage device in this specific embodiment includes: a first storage chip 101 and a second storage chip 102, and the first storage chip 101 and the second storage chip 102 are stacked and connected.
[0038] The first memory chip 101 and the second memory chip 102 may be different types of memory chips respectively. In a specific implementation manner, the first memory chip 101 is a volatile memory chip, and the second memory chip 102 is a non-volatile memory chip. In this specific implementation manner, the first storage chip 101 is a DRAM chip, and the second storage chip 102 is...
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