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Base material for liquid filters

A liquid filter and substrate technology, applied in chemical instruments and methods, membranes, membrane technology, etc., can solve the problems of high efficiency requirements, semiconductor precision filters without any design considerations, etc., and achieve the goal of improving manufacturing efficiency Effect

Pending Publication Date: 2021-03-02
TEIJIN LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In particular, as in International Publication No. 2014 / 181760, it is important to solve the important problem of a precision filter as a semiconductor in terms of simultaneously realizing the trapping performance and liquid permeability of fine particles smaller than about 10 nm, but because it has more A membrane with a fine pore size, so there is a high demand for efficiency when manufacturing the above-mentioned filter cartridges
In addition, although Japanese Patent Laid-Open No. 2011-233542 mentions the content of metal ions, it is a polyolefin microporous membrane used for battery separators, and there is no consideration or design for precision filters for semiconductors.

Method used

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  • Base material for liquid filters
  • Base material for liquid filters

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0139]A polyethylene composition mixed with: 18.4 parts by mass of high molecular weight polyethylene (PE1) having a Ca content of 140 ppb and a weight average molecular weight of 5.1 million; and a low molecular weight polyethylene having a Ca content of 270 ppb and a weight average molecular weight of 650,000 4.6 parts by mass of polyethylene (PE2). A polyethylene solution was prepared by mixing with a previously prepared mixed solvent of 74.5 parts by mass of liquid paraffin and 2.5 parts by mass of decalin (decalin) so that the concentration of the total amount of polyethylene resin was 23% by mass.

[0140] This polyethylene solution was extruded from a die at a temperature of 155°C in a sheet form to obtain an extruded product. The extrudate was cooled in a water bath at 20°C, and while a water flow was set on the surface of the water bath so that the mixed solvent discharged from the gelled sheet in the water bath and suspended on the water surface did not reattach to t...

Embodiment 2

[0144] A polyethylene composition mixed with: 18.4 parts by mass of high molecular weight polyethylene (PE1) having a Ca content of 140 ppb and a weight average molecular weight of 5.1 million; and a low molecular weight polyethylene having a Ca content of 270 ppb and a weight average molecular weight of 650,000 4.6 parts by mass of polyethylene (PE2). A polyethylene solution was prepared by mixing with a previously prepared mixed solvent of 75.9 parts by mass of liquid paraffin and 1.1 parts by mass of decalin (decalin) so that the concentration of the total amount of polyethylene resin would be 23% by mass.

[0145] This polyethylene solution was extruded from a die at a temperature of 158° C. into a sheet to obtain an extruded product. Cool the extrudate in a water bath at 18°C, and set a water flow on the surface of the water bath so that the mixed solvent discharged from the gelled sheet in the water bath and suspended on the water surface does not reattach to the sheet. ...

Embodiment 3

[0148] A polyethylene composition mixed with: 12.5 parts by mass of high molecular weight polyethylene (PE1) having a Ca content of 140 ppb and a weight average molecular weight of 5.1 million; and a low molecular weight polyethylene having a Ca content of 270 ppb and a weight average molecular weight of 650,000 12.5 parts by mass of polyethylene (PE2). A polyethylene solution was prepared by mixing with a previously prepared mixed solvent of 72.5 parts by mass of liquid paraffin and 2.5 parts by mass of decalin (decalin) so that the concentration of the total amount of polyethylene resin was 25% by mass.

[0149] This polyethylene solution was extruded from a die at a temperature of 156° C. into a sheet to obtain an extruded product. The above-mentioned extrudate was cooled in a water bath at 18°C, and while a water flow was set on the surface of the water bath so that the mixed solvent discharged from the gelled sheet in the water bath and suspended on the water surface did ...

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Abstract

The present disclosure provides a base material for liquid filters, the base material being composed of a polyolefin microporous membrane, wherein: the average flow pore size in a pore size distribution of the polyolefin microporous membrane as measured by a half-dry method based on gas-liquid phase substitution is 1-50 nm; the calcium content in the polyolefin microporous membrane is 2000 ppb orless; and the ratio of the tensile elongation in the machine direction (MD) to the tensile elongation in the transverse direction (TD) perpendicular to the machine direction for the polyolefin microporous membrane is 0.47-0.96 (exclusive of 0.96), or 1.25-7 (exclusive of 1.25).

Description

technical field [0001] The present disclosure relates to substrates for liquid filters. Background technique [0002] In recent years, miniaturization and performance enhancement of electronic devices have been progressing. In particular, digital devices and mobile terminals represented by personal computers and smart phones are making great progress. As we all know, technological innovation in the semiconductor industry has played a major role in various technologies leading and supporting this progress. In the semiconductor industry in recent years, in terms of wiring pattern size, there has been a trend of development competition in the field of less than 20nm, and companies are rushing to establish state-of-the-art production lines. [0003] The photolithography process is a process of forming a pattern in the manufacture of semiconductor components. With the miniaturization of patterns in recent years, not only the properties of the chemical liquid used in the photol...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D71/26B01D69/02
CPCB01D69/02B01D2325/028B01D2325/20B01D2325/24B01D67/002B01D71/261B01D71/262B01D2325/341B01D2325/02832B01D2325/02833B01D2323/21811B01D2323/12B01D2325/02B01D2325/04
Inventor 岩井亚由美古谷幸治长尾优几田良和
Owner TEIJIN LTD