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Fluorine purification device and method

A purification device and fluorine gas technology, applied in chemical instruments and methods, separation methods, gas treatment and other directions, can solve the problems of poor purification effect, difficult to fully contact and react with fluorine gas, and achieve the effect of preventing clogging

Pending Publication Date: 2021-03-16
PERIC SPECIAL GASES CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] In the prior art, in the purification process of removing hydrogen fluoride by adsorption method, the adsorbent is usually stacked in the filter tower, and then the fluorine gas is passed into the filter tower to purify the fluorine gas. Since the adsorbent is usually in powder form, and Accumulation in the filter container makes it difficult for fluorine gas to fully contact and react with the adsorbent, so that the purified fluorine gas still contains a certain amount of hydrogen fluoride gas, and the purification effect is not good

Method used

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  • Fluorine purification device and method
  • Fluorine purification device and method
  • Fluorine purification device and method

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Embodiment 1

[0039] Purification device of a fluorine gas, such as Figure 1 ~ 7 As shown, the apparatus includes a base 1, a support plate 2, a renewal 3, a first air pipe 13, a first filter 14, a first valve, a feed mechanism, and a heat treatment mechanism.

[0040] The base 1 is fixedly connected to four support bars. The top is fixedly connected to the support plate 2, and the support plate 2 side walls above the base 1 are fixedly connected to the reactor 3, and the top of the reactor 3 is provided with the first inner communication with the reactor 3. The air pipe 13, the first air pipe 13 is provided with a detachable first filter 14 for removing dust and impurities in the fluorine gas, and the first air pipe 13 is provided with a first valve, the top of the reactor 3 and the progress The material is connected, and the bottom of the reactor 3 is provided, and a heat treatment mechanism is provided on the base 1.

[0041] The feed mechanism is as follows:

[0042] The transfer cartridge ...

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Abstract

The invention relates to a fluorine purification device and method, and belongs to the technical field of fluorine purification. The device comprises a base, a supporting plate, a reaction cylinder, afirst air outlet pipe, a first filter screen, a first valve, a feeding mechanism and a heat treatment mechanism, and a first driving mechanism and a purifying mechanism are arranged in the feeding mechanism. The purifying mechanism can enable an adsorbent to fully suck out hydrogen fluoride gas doped in fluorine gas, the first driving mechanism can achieve intermittent discharging to prevent thefeeding pipe from being blocked, the second driving mechanism does not need to be additionally provided with a power source to drive the second spiral conveying rod to rotate, and therefore the purpose of saving resources is achieved. The heat treatment mechanism does not need additional equipment to heat the adsorbent so that the resource utilization is more reasonable.

Description

Technical field [0001] The present invention relates to the purification apparatus and method of fluorine gas, belonging to the field of fluorine purifiers. Background technique [0002] During the preparation of fluorine gas, the mixed volume fraction in fluorine gas is 1% to 8% hydrogen fluoride (HF) gas, which requires removal of hydrogen fluoride gas before the fluorine gas is put into use, and the adsorption method is currently widely used in removal of hydrogen fluoride. By utilizing alkali metal fluoride, such as sodium fluoride, potassium fluoride, fluorinated fluoride, etc., absorbent hydrogen fluorine fluoride, such as fluorine hydrogen fluorine, potassium hydrofluoro fluorine, etc., etc. The alkali metal fluorine fluoride is above 250 ° C, and the adsorbed fluoride gas is desorbed, and the chemical properties of the alkali metal fluoride are reverted to the fluorine gas. [0003] In the prior art, the adsorption method is used to remove hydrogen fluoride purification p...

Claims

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Application Information

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IPC IPC(8): B01D53/04
CPCB01D53/0407B01D53/0438B01D53/0446B01D2257/2047B01D2259/40096
Inventor 林坤王少波徐海云王斌马朝选鲁毅王亚峰李丹丹
Owner PERIC SPECIAL GASES CO LTD
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