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Method for inhibiting influence of non-uniformity of optical material in large-aperture interferometer

An optical material, non-uniformity technology, applied in the direction of using optical devices, instruments, measuring devices, etc., can solve problems such as inapplicability, inability to pre-select the best material parts, etc., to achieve strong practicability, simplicity, flexibility and easy modification and processing. low difficulty effect

Active Publication Date: 2021-03-19
NANJING UNIV OF SCI & TECH
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Problems solved by technology

However, the large-aperture optical material in the large-aperture interferometer cannot pre-select the best material position, and this method is not applicable

Method used

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  • Method for inhibiting influence of non-uniformity of optical material in large-aperture interferometer
  • Method for inhibiting influence of non-uniformity of optical material in large-aperture interferometer
  • Method for inhibiting influence of non-uniformity of optical material in large-aperture interferometer

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Embodiment 1

[0034] combine figure 1 The large-aperture interferometer shown includes a large-aperture interferometer beam expander system and a small-port wavefront exit module, and the large-aperture interferometer beam expander system includes a first reflector 2, a small-aperture collimator 3, and a second reflector 4 , the third reflector 5, a large-diameter collimator mirror 6 and a TF standard flat plate 7; the small-port wavefront exit module produces a small-diameter collimated wavefront 1, and the small-diameter collimated wavefront 1 is folded and reflected by the first reflector 2 and then The beam expands to the second reflector 4 through the small-diameter collimator 3, folds and reflects to the large-diameter collimator 6 through the second reflector 4 and the third reflector 5, and becomes collimated after passing through the large-diameter collimator 6 The light is collimated and emitted. After the collimated light passes through the TF standard plate 7, a part of the ligh...

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Abstract

The invention discloses a method for inhibiting the influence of non-uniformity of an optical material in a large-aperture interferometer. The method provides an analog simulation and correction scheme for the influence of material heterogeneity of a large-aperture collimating lens and a TF standard flat plate in the large-aperture interferometer. The method comprises the following steps: establishing a beam expanding system model in optical design software Zemax; adopting a polynomial to represent the refractive index non-uniformity of the large-aperture optical material; realizing modeling of a large-aperture collimating lens with three-dimensional refractive index distribution and a standard flat plate by adopting a self-defined surface type in Zemax, and simulating and analyzing the influence of non-uniformity of the refractive index of a large-aperture material. On the basis of accurate modeling of a beam expanding system, the influence of non-uniformity of a large-aperture optical material is suppressed by optimizing surface shape parameters of the front surfaces of a small-aperture collimating mirror and a TF standard flat plate. Three-dimensional distribution of the refractive index of the large-aperture optical material is accurately modeled, the influence of non-uniformity of the large-aperture optical material is suppressed by optimizing parameters of the small-aperture collimating mirror, and the method is high in precision and good in practicability.

Description

technical field [0001] The invention relates to the field of optical design of precision optical instruments, in particular to a method for suppressing the influence of non-uniformity of optical materials in a large-diameter interferometer. Background technique [0002] Interferometer is an instrument using optical interference detection technology, which can realize non-contact measurement of wavelength level, and is one of the most effective and accurate means to detect optical components and optical systems. With the development of science and technology, large-scale optical components are gradually being widely used in frontier scientific fields such as astronomy, aerospace, and energy, and the detection demand for large-aperture optical components is increasing day by day. The large-aperture interferometer can directly measure the surface shape of large-aperture optical components, and the method has high precision and high measurement efficiency. [0003] The influenc...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B9/02
CPCG01B9/02075
Inventor 高志山刘威剑袁群第五蔻蔻王若言季文
Owner NANJING UNIV OF SCI & TECH
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