Method for measuring thickness of rubidium hydride relaxation-resistant film on inner wall of atomic gas chamber
A technology of atomic gas chamber and measurement method, which is applied in the direction of measuring devices, instruments, optical devices, etc., and can solve problems such as the preparation and optimization of atomic gas chambers that limit the anti-relaxation coating
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[0022] Below in conjunction with accompanying drawing, the present invention is described in further detail:
[0023] A method for measuring the thickness of an atomic gas inner wall rubidium hydride anti-relaxation film layer in the present invention comprises the following steps:
[0024] (1) Prepare a quartz atomic gas chamber glass bulb with a side length of 10 mm and a wall thickness of 01 mm, and fill the glass bulb with 100 Torr of hydrogen and 0.1 mg of rubidium, and form rubidium hydride on the inner wall of the atomic gas chamber through a chemical reaction Anti-relaxation film layer;
[0025] (2), put the anti-relaxation coating atomic gas cell sample into the glove box and fix it, and use a vacuum pump to evacuate the glove box until the pressure is less than 5×10 -2 Pa, filled with 760Torr helium, cut open the sample of the atomic gas chamber;
[0026] (3) Under a helium atmosphere, use an atomic force microscope to measure the thickness of the film on the inner...
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