A kind of positive photoresist developing solution for flat panel display

Abstract

The invention discloses a positive photoresist developing solution used in a flat panel display TFT-array photolithography process. The composition of the positive photoresist developer is organic base 2~5%, quaternary ammonium salt gemini surfactant 0.5%~5%, nonionic surfactant 1%~10%, organic additive 0.5%~2% , The balance is deionized water. In the present invention, by adding the quaternary ammonium base gemini surfactant, the obtained positive photoresist developer has good developability and pattern reproducibility, can effectively improve the yield of good products, and meets the requirements of high-resolution TFT display screens. At the same time, the developing solution has strong dissolving power to photoresist residue, less foam, wide process temperature, and good application prospect.

Description

technical field [0001] The invention belongs to the technical field of flat panel display manufacturing, and in particular relates to a positive photoresist developing solution used in a flat panel display TFT-Array photolithography process. Background technique [0002] In the current flat-panel display industry, TFT-LCD and TFT-OLED are the mainstream technologies. With the continuous improvement of display technology, the precision of photolithography process is also improving. In the Array segment of the LCD and OLED manufacturing process, the positive photoresist needs to be evenly coated on the substrate, then exposed with a mask plate, and then developed with an alkaline developer to remove the unexposed part, and so on for 5 times. -10 times to get the required fine pattern, so it is particularly important to improve the yield of each process. In the development process, the performance of the developer is directly related to the yield of development. At present, t...

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Problems solved by technology

[0003] The patent with the publication number CN101872136A mentions a general-purpose developing solution containing an alkyl glycoside surfactant, which has good developing precision, but the alkyl glycoside surfactant has rich and fine foams, and a large The accumulation of foam will affect the reaction between the developer and the photoresist interface, resulting in a decrease in yield, so it is difficult to adapt to the currently commonly used high-pressure spraying process

The patent with the publication number CN201110243898.1 mentions a developer solution for OLEDs, which effectively reduces the impact of foam on the process yield by adding fluorine-containing surfactants. Excellent developing effect, but the developing speed of i-line photoresist process and DUV photoresist process is too fast, which will affect the pattern accuracy

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