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Method for generating and processing a uniform high density plasma sheet

A high-density plasma, plasma technology, applied in the field of plasma, can solve the problems of consumption, plasma uniformity difficulties, high power and so on

Pending Publication Date: 2021-04-09
DYSON TECH LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, controlling the uniformity of the plasma produced by such a multi-loop antenna system is difficult due to the need to tune the antenna to the precise equivalent power and frequency to achieve plasma uniformity
The multi-loop antenna setup also consumes a lot of power due to the generation of multiple plasmas

Method used

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  • Method for generating and processing a uniform high density plasma sheet
  • Method for generating and processing a uniform high density plasma sheet
  • Method for generating and processing a uniform high density plasma sheet

Examples

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Embodiment Construction

[0019]Referring to the drawings, the details of the methods, structures, and devices according to the invention will become apparent as described.

[0020]The plasma processing apparatus 1 includes a processing chamber 2, a plasma generating system 3, a target assembly 4, a substrate assembly 5, a magnet 6 having a related power source 7, and a processing gas supply system 8.

[0021]In a particular embodiment, the processing chamber 2 is a sealing box with at least a plasma generating system 3, a target assembly 4, and a substrate assembly 5. In a particular embodiment, the plasma generating system 3 and the substrate assembly 5 are placed close to each other in the processing chamber 2. Since the plasma generating system 3 and the substrate assembly 5 are in the same cavity space (i.e., there is no separate plasma chamber for generating plasma), the processing chamber 2 can be said to be partial plasma generating region (including Plasma generating system 3) and processing area (includi...

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Abstract

A method of generating and processing a uniform high density plasma sheet (24). The method comprising generating a plasma within a chamber (2) using plasma source (3); and within the same chamber containing and shaping the plasma using magnetic and / or electrostatic fields. The plasma is propagated as a uniform high density sheet within the chamber.

Description

Technical field[0001]The present invention relates to a method for generating and treating a plasma. More specifically, the present invention relates to a method of depositing a material on a substrate using a uniform high density plasma sheet.Background technique[0002]High density plasma is widely used in industrial applications. For example, such plasma can be used to clean or prepare applications, etch applications, alter surface structures or densities, and film deposition. The current method for generating a wide continuous sheet of a high density plasma requires a plasma source having a plasma chamber to produce a working plasma (i.e., a remote plasma source). An example of such a plasma source is a multi-ring antenna device that requires many antennas to produce a wide working plasma. However, since it is necessary to tune the antenna to an accurate equivalent power and frequency to obtain plasma uniformity, it is difficult to control the uniformity of the plasma generated by...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/32H01J37/34C23C14/34
CPCH01J37/321H01J37/3211H01J37/32467H01J37/3266H01J37/345H01J37/3458H01J37/34H01J37/32697C23C14/351H01J37/32009C23C14/34C23C16/50H01J37/32082H01J37/32669H05H1/03H05H1/04H05H1/24H01J2237/332
Inventor M.思韦茨P.霍克利
Owner DYSON TECH LTD