A kind of diamond abrasive liquid for wafer substrate
A diamond and grinding fluid technology, applied in the field of grinding fluid and fine chemical industry, can solve the problems of difficult cleaning of the grinding fluid disk surface, high cost of disposal of abrasive waste liquid, affecting the quality of LEDs, etc. Sexual, easy-to-rinse effect
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Embodiment 1
[0020] The diamond grinding fluid of the present embodiment consists of the following components in parts by weight: 0.5% diamond micropowder, 4% dispersant, 0.1% metal ion scavenger, 0.1% surfactant, 70% lubricant, 27.3% organic solvent. The pH regulator is triethanolamine, and the pH of the diamond polishing liquid for sapphire grinding in this embodiment is 7.5.
[0021] Table 1 Example 1-15 grinding liquid and comparative example grinding liquid components and mass content
[0022]
[0023]
[0024] The raw materials in the examples of the present application were all purchased through commercial channels. Such as Dow Chemical, Ticam and so on.
[0025] In the embodiment of the application, the analytical testing method is as follows:
[0026] For the above-mentioned diamond abrasive liquid, the sapphire substrate was polished and tested; at the same time, the wafer polished by the above-mentioned abrasive liquid was cleaned with deionized water, and the ease of cl...
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