Embedded panel structure and manufacturing method thereof
A manufacturing method and embedded technology, applied in semiconductor/solid-state device manufacturing, data processing input/output process, instruments, etc., can solve problems such as excessive noise, high technical requirements, lower yield, etc., to reduce panel The effect of thickness, reducing pixel area and increasing aperture ratio
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[0069] In order to explain in detail the technical content, structural features, achieved goals and effects of the technical solution, the following will be described in detail in conjunction with specific embodiments and accompanying drawings.
[0070] see Figure 1 to Figure 19 In this application, a method for manufacturing an embedded panel structure is provided, including the steps of: dividing the substrate 1 into a light-transmitting capacitor area 100, a TFT area 200, and a substrate area 300; please refer to Figure 17 to Figure 19 ,exist Figure 17 to Figure 19 The etching method of the gate metal layer 3 and the first light-transmitting conductive layer is listed in ; meanwhile, the manufacturing method of the second light-transmitting conductive layer and the source-drain metal layer is also the same, only the first light-transmitting conductive layer needs to be Layer is replaced by the second light-transmitting conductive layer, and the gate metal layer is repla...
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