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A kind of boron-doped diamond film electrode foam ceramic substrate and preparation method thereof

A technology of boron-doped diamond and thin-film electrodes, which is applied in the fields of boron-doped diamond thin-film electrode foam ceramic substrate and its preparation, boron-doped diamond thin-film electrodes and its preparation, and can solve the problems of shortened service life and damage of boron-doped diamond thin-film electrodes, Achieve the effect of reducing impact force and ensuring integrity

Active Publication Date: 2022-07-01
JIANGXI XINYUAN NEW MATERIAL TECH CO LTD +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The invention provides a boron-doped diamond film electrode foam ceramic substrate and its preparation method, a boron-doped diamond film electrode and its preparation method, in order to solve the problem of fluid flowing through the boron-doped diamond film electrode foam ceramic substrate in the prior art The continuously increasing impact force caused by the continuous collision of the hole wall of the foam ceramic substrate causes the foam ceramic substrate to be damaged along the hole wall, and the impact force caused by the fluid acts on the installation position of the boron-doped diamond film electrode. When the impact force causes the boron-doped diamond film electrode to Problems such as deviating from the installation position and shortening the service life of boron-doped diamond film electrodes

Method used

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  • A kind of boron-doped diamond film electrode foam ceramic substrate and preparation method thereof
  • A kind of boron-doped diamond film electrode foam ceramic substrate and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Example 1: Boron-doped diamond thin film electrode foam ceramic matrix

[0027] figure 1 A three-dimensional view of the foamed ceramic substrate of the boron-doped diamond thin film electrode in this embodiment is shown, figure 2 The edge of the foamed ceramic matrix of the boron-doped diamond thin film electrode in this example is shown. figure 1 A cross-sectional view in the A-A direction.

[0028] like figure 1 and figure 2As shown, the boron-doped diamond thin film electrode foamed ceramic substrate 1 of this embodiment includes a core portion 13 in the center, a middle portion 12 and a boron-doped diamond thin film deposition portion 11 . The intermediate portion 12 is attached to the outer surface of the core portion 13 at intervals. The boron-doped diamond thin film deposition portion 11 is located on the outer surface of the intermediate portion 12 and the exposed face of the core portion 13 at the interval between the intermediate portion 12 . The co...

Embodiment 2

[0034] Example 2: Preparation method of boron-doped diamond thin film electrode foam ceramic matrix

[0035] This embodiment provides a method for preparing a boron-doped diamond thin film electrode foamed ceramic substrate according to Embodiment 1, which includes the following steps:

[0036] S1, the ceramic powder is pre-pressed and then sintered to prepare the core of the boron-doped diamond thin film electrode foam ceramic matrix;

[0037] S2. Cut the energy-absorbing material to a predetermined size, attach it to the outer surface of the core at intervals, and coat the outer surface of the energy-absorbing material attached to the outer surface of the core with a heat insulating material to obtain a boron-doped diamond film The middle part of the electrode foam ceramic substrate;

[0038] S3, preparing a ceramic slurry containing the ceramic powder, sintering aid and foaming agent used in step S1;

[0039] S4. Injecting part of the ceramic slurry into the mold and pa...

Embodiment 3

[0042] Example 3: A Boron-Doped Diamond Thin Film Electrode

[0043] A boron-doped diamond thin film electrode of this embodiment includes the foamed ceramic substrate of the boron-doped diamond thin film electrode of Embodiment 1.

[0044] The boron-doped diamond thin film electrode of this embodiment has the foamed ceramic substrate of the boron-doped diamond thin film electrode of Embodiment 1, which will not be damaged by the impact force generated by the fluid colliding with the pore walls of the pores of the foamed ceramic substrate during use, nor will it be damaged during use. The boron-doped diamond thin film electrode in this embodiment has a long service life because it may be dislodged from the installation position due to impact force. In addition, the boron-doped diamond thin film electrode of this embodiment has the beneficial effects of the boron-doped diamond thin film electrode foamed ceramic substrate of the first embodiment.

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Abstract

The invention provides a boron-doped diamond thin film electrode foamed ceramic matrix, which comprises a core, a middle part attached to the outer surface of the core at intervals, and a boron-doped diamond on the exposed surface of the core at the interval between the outer surface of the middle part and the middle part. The film deposition part; the core part and the boron-doped diamond film deposition part are made of ceramic material, the middle part is an energy-absorbing material whose outer surface is covered with heat insulating material, and the boron-doped diamond film deposition part is a foam-like structure composed of interpenetrating holes . The core part of the present invention provides mechanical support for the substrate, shares part of the fluid impact force acting on the electrode installation position, and reduces the possibility of the electrode leaving the installation position; The impact force generated by the interpenetrating holes of the boron-diamond film deposition part is effectively absorbed by the middle part when it hits the middle part, avoiding the problem that the impact force is too large when the impact force penetrates the entire electrode, which causes the matrix to be damaged along the hole wall and the electrode life is shortened. .

Description

technical field [0001] The invention relates to the technical field of electrochemical electrodes, in particular to a boron-doped diamond thin film electrode foamed ceramic substrate and a preparation method thereof, as well as a boron-doped diamond thin film electrode and a preparation method thereof. Background technique [0002] With the development of petroleum, chemical, pharmaceutical and other industries, the number and types of refractory substances in industrial wastewater are increasing. In order to solve the problem of wastewater pollution, researchers have carried out a lot of research on wastewater treatment technology. The study found that among many water treatment technologies, compared with other water treatment technologies, electrochemical oxidation is an environment-friendly technology. It has the characteristics of wide treatment range, less secondary pollution, good controllability and low cost. An important development direction in the field of process...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C04B38/10C04B35/52C04B35/622C04B35/64C02F1/461
CPCC04B38/10C04B35/52C04B35/622C04B35/64C02F1/46109C04B2235/421C02F2001/46138
Inventor 王传奇玄真武曹延新訾蓬赵小玻徐金昌李小安冀忠辉杨子萱
Owner JIANGXI XINYUAN NEW MATERIAL TECH CO LTD
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