Deep-adsorption and high-moisture-retention mask and production method thereof
A kind of facial mask, deep technology, applied in the directions of pharmaceutical formulations, cosmetics, non-woven fabrics, etc., can solve the problems of affecting the experience of using the facial mask, affecting the use of the facial mask, and the fibers are scattered and broken, and achieves a good adsorption effect, improves softness, and good elasticity. and strength effects
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Embodiment 1
[0033] refer to figure 1 As shown, the present embodiment discloses a production system of deep absorption and high moisturizing facial mask, comprising an opening device, a carding device, a web laying device and a spunlace device; The equipment does not have a large differential pressure, and it only needs to be applicable; three sets of spunlace devices are arranged in a row, and adjacent spunlace devices are connected by a fabric turning net 40, which can turn over the mask membrane material.
[0034] Turning cloth conveying net 40 can transport the mask film material output among the previous group of spunlace devices to the next group of spunlace devices, and the conveying direction of adjacent spunlace devices is opposite, and the mask film material in the previous spunlace device from The output of the output end is transported by the cloth turning net 40, so that the mask membrane material is input from the output end of the next spunlace device, and double-sided spun...
Embodiment 2
[0038] This embodiment discloses another production system of deep adsorption and high moisturizing facial mask. On the basis of Embodiment 1, refer to figure 2 To illustrate, further optimize the spunlace device to improve the effect of spunlace.
[0039] The spunlace component uses the spunlace reagent to spunlace the mask film material, wherein the spunlace head 39 in the spunlace component is provided with a high-pressure liquid chamber 2, which is set in the width direction of the mask film material, and is placed in the high-pressure liquid A filter tube 4 is set in the cavity 2, and the water inlet position in the high-pressure liquid cavity 2 is located in the filter tube 4, so that the filter tube 4 can filter the impurities in the spunlace reagent and prevent the impurities in the spunlace reagent from clogging the spunlace head 39 .
[0040] Two inverted cone-shaped baffles 3 are installed at the lower part of the high-pressure liquid chamber 2. The two baffles 3 ...
Embodiment 3
[0048] This embodiment discloses another production system of deep adsorption and high moisturizing facial mask. On the basis of embodiment two, refer to figure 2 To illustrate, further optimize the spunlace device to improve the effect of spunlace and increase the stability of the prepared mask membrane material.
[0049] The water outlet tray 14 in the spunlace device is set to a rotatable and adjustable structure, the water outlet tray 14 is rotatably connected to the lower end of the water outlet pipe 5, and is sealed by a seal to ensure that the spunlace reagent can flow smoothly; in the lower part of the current collector 1 Bearing 19 is set, through bearing 19, the motion of water outlet tray 14 can be rotatably supported, and motor 21 is set on one side of water outlet tray 14, with motor 21 as driving member, transmission gear 20 is installed on the output end of motor 21, and transmission The gear 20 is engaged with the gears on the outer periphery of the water outl...
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