Deep-adsorption and high-moisture-retention mask and production method thereof

A kind of facial mask, deep technology, applied in the directions of pharmaceutical formulations, cosmetics, non-woven fabrics, etc., can solve the problems of affecting the experience of using the facial mask, affecting the use of the facial mask, and the fibers are scattered and broken, and achieves a good adsorption effect, improves softness, and good elasticity. and strength effects

Active Publication Date: 2021-05-07
绍兴莱洁新材料科技有限公司
View PDF9 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The mask consists of two parts, the matrix and the membrane material. The matrix contains moisturizing ingredients and care agents, which are absorbed through the membrane material. During the development of the mask, a large number of researchers have improved the matrix components. However, most of the general-purpose non-woven fabrics are used as the film material of the mask. Although the non-woven fabric also has a certain water absorption effect, in order to increase the effective matrix adsorption amount in the mask, it is necessary to increase the thickness of the mask, which will affect the thickness of the mask. Use experience; and the connection between the fibers in the non-woven fabric is relatively loose, which will affect the strength of the mask when the mask is thinner, and the fibers will break apart during use, which will affect the use of the mask

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Deep-adsorption and high-moisture-retention mask and production method thereof
  • Deep-adsorption and high-moisture-retention mask and production method thereof
  • Deep-adsorption and high-moisture-retention mask and production method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] refer to figure 1 As shown, the present embodiment discloses a production system of deep absorption and high moisturizing facial mask, comprising an opening device, a carding device, a web laying device and a spunlace device; The equipment does not have a large differential pressure, and it only needs to be applicable; three sets of spunlace devices are arranged in a row, and adjacent spunlace devices are connected by a fabric turning net 40, which can turn over the mask membrane material.

[0034] Turning cloth conveying net 40 can transport the mask film material output among the previous group of spunlace devices to the next group of spunlace devices, and the conveying direction of adjacent spunlace devices is opposite, and the mask film material in the previous spunlace device from The output of the output end is transported by the cloth turning net 40, so that the mask membrane material is input from the output end of the next spunlace device, and double-sided spun...

Embodiment 2

[0038] This embodiment discloses another production system of deep adsorption and high moisturizing facial mask. On the basis of Embodiment 1, refer to figure 2 To illustrate, further optimize the spunlace device to improve the effect of spunlace.

[0039] The spunlace component uses the spunlace reagent to spunlace the mask film material, wherein the spunlace head 39 in the spunlace component is provided with a high-pressure liquid chamber 2, which is set in the width direction of the mask film material, and is placed in the high-pressure liquid A filter tube 4 is set in the cavity 2, and the water inlet position in the high-pressure liquid cavity 2 is located in the filter tube 4, so that the filter tube 4 can filter the impurities in the spunlace reagent and prevent the impurities in the spunlace reagent from clogging the spunlace head 39 .

[0040] Two inverted cone-shaped baffles 3 are installed at the lower part of the high-pressure liquid chamber 2. The two baffles 3 ...

Embodiment 3

[0048] This embodiment discloses another production system of deep adsorption and high moisturizing facial mask. On the basis of embodiment two, refer to figure 2 To illustrate, further optimize the spunlace device to improve the effect of spunlace and increase the stability of the prepared mask membrane material.

[0049] The water outlet tray 14 in the spunlace device is set to a rotatable and adjustable structure, the water outlet tray 14 is rotatably connected to the lower end of the water outlet pipe 5, and is sealed by a seal to ensure that the spunlace reagent can flow smoothly; in the lower part of the current collector 1 Bearing 19 is set, through bearing 19, the motion of water outlet tray 14 can be rotatably supported, and motor 21 is set on one side of water outlet tray 14, with motor 21 as driving member, transmission gear 20 is installed on the output end of motor 21, and transmission The gear 20 is engaged with the gears on the outer periphery of the water outl...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a deep-adsorption and high-moisture-retention mask and a production method thereof, and relates to the technical field of masks. A special production system is adopted in the production process, and the deep-adsorption and high-moisture-retention mask comprises an opening device, a carding device, a lapping device and a spunlace device; the spunlace device comprises a rotary screen roller, a plurality of guide rollers are arranged on the two sides of the rotary screen roller, a spunlace head assembly is arranged on one side of the rotary screen roller, a plurality of spunlace heads are arranged on the spunlace head assembly, and the spunlace heads are distributed in an arc array around the rotary screen roller. According to the deep-adsorption and high-moisture-retention mask and the production method thereof, the compactness of fibers in a mask material is improved, intertwining degree among the fibers is increased, and the content of effective matrixes adsorbed in the mask is increased.

Description

technical field [0001] The invention relates to the technical field of facial masks, more specifically, it relates to a deeply adsorbed and highly moisturizing facial mask and a production method thereof. Background technique [0002] With the improvement of living standards, more and more people are used to facial maintenance and care. Facial mask is a product that people often use, and it is in contact with the skin for a certain period of time by smearing or sticking to care for the skin. In the process of contact with the skin, the cosmetic or pharmaceutical ingredients contained in the mask will have cosmetic effects (such as moisturizing the skin, promoting blood circulation, etc.) and can absorb and remove oil and cutin on the skin surface during the process of peeling off the mask . [0003] The mask consists of two parts, the matrix and the membrane material. The matrix contains moisturizing ingredients and care agents, which are absorbed through the membrane mater...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): D04H1/492D04H1/4382D04H18/04A61K8/02A61K8/19A61K8/34A61K8/365A61K8/73A61K8/9706A61Q19/00
CPCD04H1/492D04H1/4382D04H18/04A61K8/9706A61K8/735A61K8/19A61K8/345A61K8/365A61K8/0212A61Q19/00A61K2800/5922
Inventor 林鹏傅明晟詹许春韩利
Owner 绍兴莱洁新材料科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap