Deionized water wet oxidation reflux device for semiconductor manufacturing

Abstract

The invention provides a deionized water wet oxidation reflux device for semiconductor manufacturing. The device comprises a base, an L-shaped rotating arm connected with a belt is arranged on the lower side of a condensing device, a metal rod is arranged in the L-shaped rotating arm, the lower part of the L-shaped rotating arm is connected with a ball body, and a suction device comprises a partition plate, a magnetic block, a guide plate and an inlet / outlet; and a circular plate is arranged in the suction device, and the lower end of the separation cylinder is connected with an electric plate. Magnetic induction lines on the magnetic block are cut through the metal rod on the L-shaped rotating arm, the metal rod cuts the magnetic induction lines to generate current, the positive electrode and the negative electrode of the current are led to the electric plate, and condensed deionized water and soluble organic matter in a separation barrel are adsorbed through the electric plate; and the suction device intermittently extracts ions and soluble organic matters around the electric plate through the suction ring pipe, and the structure solves the problems that more deionized water is used and wasted, and the soluble organic matters can pollute the ion exchange column so as to reduce the effect of the ion exchange column.

Description

technical field [0001] The invention belongs to the technical field of semiconductor discrete device manufacturing, and in particular relates to a deionized water wet oxidation reflow device for semiconductor manufacturing. Background technique [0002] A semiconductor is a substance with an electrical conductivity between an insulator and a conductor. Its electrical conductivity is easy to control and can be used as a component material for information processing. From the perspective of technology or economic development, semiconductors are very important. Like many electronic products, such as computers, mobile phones, and digital recorders, the core units use the changes in the conductivity of semiconductors to process information. [0003] Semiconductor discrete device manufacturing is a kind of semiconductor extended manufacturing. Wet water vapor oxidation is an indispensable process for semiconductor discrete device manufacturing. The existing wet water vapor oxidati...

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Problems solved by technology

[0003] Semiconductor discrete device manufacturing is a kind of semiconductor extended manufacturing. Wet water vapor oxidation is an indispensable process for semiconductor discrete device manufacturing. The existing wet water vapor oxidation equipment uses electric furnace to heat deionized water to form deionized water vapor. Oxygen is transported into the electric furnace to be heated and mixed with deionized water vapor, and then input into the diffusion furnace to grow the oxide layer on the semiconductor device, but the input deionized steam cannot be recycled, resulting in more use of deionized water and waste; in addition, the existing deionized water recycling device uses ion exchange resin to remove anions and cations in the water, but there are still soluble organics in the water, which can contaminate the ion exchange column and reduce its efficacy. It is also easy to store deionized water cause bacterial growth

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