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Liquid metal target extreme ultraviolet light source system

An extreme ultraviolet light source, liquid metal technology, applied in optics, optomechanical equipment, microlithography exposure equipment, etc., to achieve the effect of simple structure, satisfying power stability, and simple structure

Pending Publication Date: 2021-05-25
芶富均
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Problems solved by technology

[0003] The purpose of the present invention is to provide a liquid metal target extreme ultraviolet light source system to solve the technical problem of generating a stable and efficient 13.5nm light source in the above-mentioned prior art

Method used

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  • Liquid metal target extreme ultraviolet light source system

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Embodiment Construction

[0022] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0023] Such as figure 1 As shown, a liquid metal target EUV light source system includes: a plasma source 1, a vacuum chamber 2, a liquid metal target 20, a laser 11 and a vacuum pump 16, an...

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Abstract

The invention discloses a liquid metal target extreme ultraviolet light source system which is characterized in that a liquid metal target is inserted into a vacuum chamber from the top, liquid metal is contained in the liquid metal target, the bottom of the vacuum chamber is connected with a plasma source, the plasma source is provided with an air inlet, a discharge area and a nozzle, and the nozzle is communicated with the vacuum chamber; the nozzle corresponds to the liquid metal target in position, plasma steam clouds are generated at the bottom of the liquid metal target during working, the plasma source is powered by a plasma power source, an input port and an outlet port are formed in the outer side of the vacuum cavity, and a laser is arranged at the input port. A laser beam generated by the laser enters the vacuum chamber through the input port and bombards the plasma steam cloud cluster, the lead-out port allows an extreme violet light guide light path to pass through, the outer side of the vacuum chamber communicates with a vacuum pump, and a magnetic field coil is arranged on the outer side of the lower area of the plasma source and the vacuum chamber and powered by a coil power source. The technical problem that a stable and efficient 13.5 nm light source needs to be generated in the prior art is solved.

Description

technical field [0001] The invention belongs to the field of detection devices, in particular to a liquid metal target extreme ultraviolet light source system. Background technique [0002] Lithography is one of the main links in chip manufacturing technology. Lithography machines are divided into ultraviolet light source (UV), deep ultraviolet light source (DUV), and extreme ultraviolet light source (EUV). With the development of integrated circuits, the demand for highly integrated technology has gradually increased, and most electronic components and storage units tend to be ultra-miniaturized. The core of the production of ultra-small chips using extreme ultraviolet light source (EUV) is a new generation of exposure technology. For EUV lithography machines used in industrial production, the key components of multi-layer coated mirrors, light collectors, etc. have high performance parameters, and if they do not meet the requirements, the working efficiency of the optical...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/70008
Inventor 芶富均陈波陈建军
Owner 芶富均
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