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Liquid phase growth device and liquid phase growth method of silicon carbide single crystal

A silicon carbide single crystal, liquid phase growth technology, applied in the direction of single crystal growth, single crystal growth, crystal growth, etc., can solve the problems of low solubility, achieve temperature stability, improve dislocation defects, and strong safety effects

Inactive Publication Date: 2021-06-08
CEC COMPOUND SEMICON CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] In view of the shortcomings of the prior art described above, one of the objectives of the present invention is to provide a liquid phase growth device for silicon carbide single crystals, which realizes the solution of SiC obtained at high temperature under normal pressure, while solving the problem of carbon For the problem of low solubility in Si solution, using the device of the present invention to carry out liquid phase growth effectively improves the dislocation defects in the growth process of silicon carbide single crystal

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  • Liquid phase growth device and liquid phase growth method of silicon carbide single crystal
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  • Liquid phase growth device and liquid phase growth method of silicon carbide single crystal

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Embodiment Construction

[0023] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and the details in this specification can also be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention.

[0024] In the present invention, it should be noted that if the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" etc. , the orientation or positional relationship indicated is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the application and simplifying the description, rather than indicating or implying that the referred device or element mu...

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Abstract

The invention discloses a liquid phase growth device and a liquid phase growth method of silicon carbide single crystal, the device comprises: a first growth assembly, a second crucible and a graphite pipe assembly, the first growth assembly is used for accommodating a first crucible used for providing a liquid phase growth place for the silicon carbide single crystal; the second crucible is contained in the second growth assembly, and a space for containing raw material carbon is formed in the second crucible; the first crucible and the second crucible are connected through the graphite pipe assembly to form a passage, a silicon solution and carbon flow and diffuse in the first crucible and the second crucible through the passage, and a supersaturated solution of the carbon in the silicon solution is formed in the first crucible; and liquid phase growth is performed to obtain the silicon carbide single crystal. According to the invention, the problems that the solubility of carbon in the silicon dissolving solution is too low and the crystal cannot grow up can be effectively solved, and the dislocation defect of the silicon carbide single crystal is effectively improved.

Description

technical field [0001] The invention relates to a silicon carbide single crystal manufacturing device, in particular to a silicon carbide single crystal liquid phase growth device and a liquid phase growth method. Background technique [0002] Silicon carbide (SiC) single crystal is one of the most important third-generation semiconductor materials. It is widely used because of its excellent properties such as large band gap, high saturation electron mobility, strong breakdown field, and high thermal conductivity Power electronics, radio frequency devices, optoelectronic devices and other fields. The 4H-SiC single crystal substrates currently on the market suffer from a variety of dislocation defects, and in general, the defect density ranges from thousands to 10,000 per square centimeter. These defects reduce the yield of devices and affect the large-scale application of SiC power devices. [0003] However, these dislocations are difficult to be well controlled in the SiC...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B29/36C30B15/12C30B15/20
CPCC30B15/12C30B15/20C30B29/36
Inventor 马远潘尧波
Owner CEC COMPOUND SEMICON CO LTD
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