Method and device for detecting ultrathin metal film by using spectrum ellipsometer

Abstract

The invention provides a method and device for detecting an ultrathin metal film by using a spectrum ellipsometer. The method comprises the following steps of: constructing a first system consisting of a silicon substrate and a natural silicon oxide layer, measuring an ellipsometric parameter of the first system, and determining an optical constant and a thickness corresponding to the first system; constructing a second system consisting of a silicon substrate, a natural silicon oxide layer and a non-absorption dielectric layer, measuring the ellipsometric parameter of the second system, and determining the optical constant and the thickness of the non-absorption dielectric layer according to the ellipsometric parameter and the optical constant and the thickness data corresponding to the first system; and constructing a third system consisting of a silicon substrate, a natural silicon oxide layer, a non-absorption dielectric layer and a metal film layer, measuring the ellipsometric parameter of the third system, and determining the optical constant and the thickness data of the metal film layer according to the ellipsometric parameter, the optical constant and the thickness data corresponding to the first system and the optical constant and the thickness data of the non-absorption dielectric layer. By adopting the method disclosed by the invention, the detection precision and sensitivity of the ultrathin metal film can be improved.

Description

technical field [0001] The invention relates to the technical field of optical measurement, in particular to a method and a device for detecting an ultra-thin metal film by using a spectroscopic ellipsometer. In addition, it also relates to an optical characterization method and device of an ultra-thin metal film using a spectroscopic ellipsometer. Background technique [0002] Spectroscopic ellipsometer is a general-purpose optical measuring instrument that uses the polarization characteristics of light to obtain information about the sample to be measured. The basic principle is to project special elliptically polarized light onto the surface of the sample to be measured through a polarizer, and measure the reflected light (or transmitted light) of the sample to obtain the polarization state change of the polarized light before and after reflection (or transmission) (including amplitude ratio and phase difference), so as to extract the relevant physical (such as optical p...

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Problems solved by technology

[0005] To this end, the present invention provides a method and device for detecting ultra-thin metal films using a spectroscopic ellipsometer to solve the problem of large deviations in measurement data and poor sensitivity in the existing measurement methods in the prior art, resulting in failure to meet actual use requirements. question

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