Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Double 90-degree deflection quadrupole plasma mass spectrometer

A volumetric mass spectrometer and quadrupole technology, applied in mass spectrometers, dynamic spectrometers, electron/ion optical devices, etc., can solve problems such as complex structural design, complex cleaning and maintenance of components, and instrument drift of off-axis ion optical systems

Pending Publication Date: 2021-07-06
BEIJING HENGSHENG INSTR CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The ion transmission detection system of commercialized mass spectrometers on the market in the early days was mainly designed in the form of photon baffle or off-axis transmission. Ion deposition causes lens voltage changes and instrument drift, resulting in reduced ion transmission efficiency
At the same time, the design of the structure of the off-axis ion optical system is relatively complicated, and the cleaning and maintenance of the components are extremely complicated.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Double 90-degree deflection quadrupole plasma mass spectrometer
  • Double 90-degree deflection quadrupole plasma mass spectrometer
  • Double 90-degree deflection quadrupole plasma mass spectrometer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] see Figure 1-3 , the present invention provides a technical solution: dual 90-degree deflection quadrupole plasma mass spectrometer, including a detector 1, the front end of the detector 1 is fixedly provided with a quadrupole mass analyzer 2, and the front end of the quadrupole mass analyzer 2 The end face of the first focusing quadrupole mechanism 3 is penetrated and fixedly connected, the head end surface of the first focusing quadrupole mechanism 3 is penetrated and fixedly connected with the end surface of the collision reaction cell 4, and the head end of the collision reaction cell 4 is connected with the second focusing quadrupole mechanism The end face of the 8 end is through and fixedly connected, the end face of the first end of the second focusing quadrupole mechanism 8 is through and fixedly connected with the end of the extraction lens structure 7, the head end of the extraction lens structure 7 is through and fixedly connected with the end of the skimmer ...

Embodiment 2

[0038] Such as Figure 4-5 As shown, the dual 90-degree deflection quadrupole plasma mass spectrometer includes a detector 1, and the front end of the detector 1 is fixedly provided with a quadrupole mass analyzer 2, and the front end of the quadrupole mass analyzer 2 is connected to the first single round rod The end face of the deflection mechanism 11 is penetrated and fixedly connected, the head end face of the first single round rod deflection mechanism 11 is penetrated and fixedly connected with the end face of the collision reaction cell 4, the head end of the collision reaction cell 4 is penetrated and fixedly connected with the end face of the second single round rod deflection mechanism 12 , the first end face of the second single round rod deflection mechanism 12 is through and fixedly connected with the end of the extraction lens structure 7, the head end of the extraction lens structure 7 is through and fixedly connected with the end of the skimmer 6, and the head e...

Embodiment 3

[0041] Such as Figure 6-7 As shown, the double 90-degree deflection quadrupole plasma mass spectrometer includes a detector 1, and the front end of the detector 1 is fixedly provided with a quadrupole mass analyzer 2, and the front end of the quadrupole mass analyzer 2 is connected to the first T-shaped deflection The end face of the mechanism 9 is penetrated and fixedly connected, the head end face of the first T-shaped deflection mechanism 9 is penetrated and fixedly connected with the end face of the collision reaction cell 4, the head end of the collision reaction cell 4 is penetrated and fixedly connected with the end face of the second T-shaped deflection mechanism 10, and the second The head end face of the T-shaped deflection mechanism 10 is connected through and fixed to the end of the extraction lens structure 7 , the head end of the extraction lens structure 7 is connected through and fixed to the end of the skimmer 6 , and the head of the skimmer 6 is connected thr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a double 90-degree deflection quadrupole plasma mass spectrometer in the technical field of plasma mass spectrometers. Double 90-degree ion deflection focusing assemblies are introduced, so that positive ions pass through a first 90-degree deflection focusing assembly after passing through an interception cone and are separated from electrons and neutral particles in a large amount of ICP ; the separated ions pass through a collision pool and then pass through a second 90-degree deflection focusing assembly, to-be-detected positive ions are separated from interference components newly introduced into the collision pool, and finally the to-be-detected positive ions reach a quadrupole mass analyzer and a detection system for detection of the to-be-detected ions. According to the invention, background noise of instruments is greatly reduced, irrelevant components cannot enter a precise quadrupole separation system, so that the quadrupole separation system and a detection system are not polluted, the device does not need to be frequently cleaned and maintained, long-term reliability of an instrument is ensured, and great convenience is brought to a user.

Description

technical field [0001] The invention belongs to the technical field of plasma mass spectrometers; in particular, it relates to a double 90-degree deflection quadrupole plasma mass spectrometer. Background technique [0002] ICP-MS is mainly composed of a sampling system, an ICP ion source, an interface part, an ion transmission system, a mass analyzer, and an ion detection system. The sample enters the ICP ion source through the sampling system and generates a large amount of positive ions at the same time. electrons, photons, neutral particles, etc. Since photons and neutral particles travel in a straight line, the analyzed ions to be measured can be deflected off-axis or by using photon baffles or 90-degree turns to separate them from uncharged particles (photons and neutral particles), and then pass through Focuses and guides the ions to be analyzed from the interface area to the mass spectrometer separation system. [0003] The ion transmission detection system of comm...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01J49/06H01J49/42G01N27/62
CPCG01N27/62H01J49/063H01J49/067H01J49/4225
Inventor 马玉平王党辉高占岭
Owner BEIJING HENGSHENG INSTR CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com