[0025] The present invention will be described in detail below with reference to the accompanying drawings:
[0026] A pneumatic assisted plasma seed treatment, reference Figure 1-2 , Includes a feed bin 1, the plasma processing chamber 2, the auxiliary air intake unit 3, and a collection bin 4 high voltage power supply control module 5 above the plasma processing chamber 2 is provided with two interfaces, provided below the airway said collector bin and the feed bin 1 4 2 are connected to the interface above the plasma processing chamber, said inlet connected to the auxiliary unit 3 below the airways 2 plasma processing chamber, said collection bin 4 is provided a suction device 41 inside the upper, a lower collecting bin 4 is provided a discharge port 42, the discharge port is provided on the control switch 42, the auxiliary air intake unit 3, and the plasma processing chamber 2 are connected to the collector bin 4 high voltage power supply control module 5, the cleaning module comprises a high-voltage power supply control module 5.
[0027] The inlet means 3 is provided to the auxiliary pump, the pump to adjust the gas velocity form.
[0028] Disclosed in detail above technical features included in the processor, the processor before the work necessary plasma processing chamber 2 and the collecting bin 4 placed on the ground by vertical support, further, the auxiliary air intake unit and the collection bin 3 and 4, respectively the plasma processing chamber 2 is connected without a gap to protect the air intake 4 and the auxiliary unit 3 the ambient air flow collecting bin, not blocked by an object, is provided by high voltage power supply operating parameter control module 5 can inspection interface, into a pre-operation state.
[0029] An auxiliary air intake unit 3 and a suction device 41 together to achieve the seeds into the collection bin, the suction device 41 sucking manner disclosed in the prior art, for example, vacuum cleaner and other ways, including, but not now to a suction mode technology disclosed.
[0030] like figure 2 Shown, the plasma processing chamber 21 inner wall of the electrode, the plasma processing chamber 2 in the intermediate position vertically disposed high voltage electrode 2 22, the high voltage electrode 22 disposed in a staggered distribution of needle-like electrode, said high voltage electrode 22 and the ground electrode 21 are connected to a high voltage power supply control module 5.
[0031] The ground electrode 21 is provided as a metal material, having conductive properties to, stainless steel preferred, the power, the plasma discharge is generated between the electrodes 21 and 22 are high voltage electrodes.
[0032] Above the plasma processing chamber 2 comprises a cover 23 communicates, comprises a base 24 below, the communication interface is provided a lid 23, the other side surface is disposed above the plasma processing chamber 2, the feed the cartridge 1 is connected to the side of the interface, the collection bin 4 connected to the interface 23 of the communication on the cover, the interfaces are provided with a control switch; the airways to three legs, three legs uniformly end disposed on the base 24, the other end of the three branches were combined and connected to the auxiliary air intake unit 3, the top of the plasma processing chamber 2 is provided with an observation window 6, the observation window 6 is provided below the insulating protective housing 7.
[0033]The above disclosure, a detailed disclosure of the plasma processing chamber 2 is provided in communication with the collecting bin cover 23 in communication 4, easy to blow the seeds fall within the collection bin 4; observation window 6 is provided in the form of a transparent, observation window 6 seeds may be observed floating state, high-voltage power adjustment parameter control module 5 controls; insulating protective insulating case 7 functions as an electrode when working seed treatment; provided stable fixing base 24 functions as a plasma processing chamber 2 and is connected an auxiliary air intake unit 3 acts.
[0034] Processor operation of the present invention disclosed herein comprises two phases, respectively, after work processors and seed treatment:
[0035] When the work processor, a lower portion of the silo into the control switch is turned on, the control switch collection bin 4 is closed, into the seed material from the hopper 1 into the plasma processing chamber 2 waiting to be processed, into the lower portion of the bin 1 control switch is closed, an auxiliary air intake unit 3 starts, the plasma processing chamber 2 in the plasma generated by energizing the seed material starting process, the high voltage supply real-time feedback control module 5 for processing parameter change, the processing time to reach the set, collection bin 4 is activated, the intake 3 with an auxiliary unit, after the completion of the processing of the collected material types, high-voltage power supply control module 5 to restore the initial operating parameter set, into the lower portion of the bin 1 control switch is turned on, airflow-assisted plasma seed processor enters the normal mode of operation.
[0036] At the end of the treatment of seed, the seed material is obtained from the collection bin 4 treatment, seed treatment open cleaning mode high voltage power supply by the control module 5, the gas flow through the plasma processing chamber 2 and the dust collecting bin and foreign objects out of 4 , off high voltage power supply control module 5, which greatly increases the service life of seed treatment, to reduce the wear on the dust processor.
[0037] The present invention is compared with conventional seed treatment techniques, the present invention provides an airflow-assisted plasma seed treatment, enhanced seed vigor by low-temperature plasma, to improve seed germination rate, ease of operation, reduced phytotoxicity of risks and hazards to the environment.
[0038] The present invention employs a needle-like electrode staggered distribution space, it is possible to produce a variety of active substances in the plasma processing chamber 2 by discharging the dispersion under atmospheric pressure forms a low temperature conditions, type of seed germination sterilization environmental pollution, does not consume any inert gas, ambient temperature and pressure in the direct environment of low temperature plasma, to improve the economics of seed treatment; the unit is provided by the auxiliary air intake 3, a gas flow to promote seed germination off to achieve reciprocating movement within the plasma processing chamber 2 means bacteria, the seeds can be fully processed in the spatial dispersion of the plasma processing chamber 2, increasing the utilization of space plasma processing chamber 2; with adjustable velocity gas suction pump and suction pump, by adjusting the gas velocity joint , to achieve reciprocal seed settling addition, pump gas velocity according to the type of seed, shape, volume, mass as repeatable matching adjustment, such that the processing needs of various suitable seeds; minimum and maximum pump disposed in the operating mode, seed treatment to achieve a unique access to material means to ensure the continuity of the seed treatment, seed treatment can improve efficiency.
[0039] The following disclosure of the present invention using the processor, on Seed and wheat seeds were not treated at the same time long, continuous culture method using soil culture after treatment, observed and recorded bean germination and growth of wheat seeds results:
[0040] Seed germination rate analysis:
[0041] Seed 1: Untreated, Seed 2: treatment 1min, mung bean seeds 3: 2min processing
[0042] The incubation 36h: Seed germination rate of 44% of 1, 2 Seed germination rate of 70%, 3 Seed germination rate of 71%;
[0043] The incubation 48h: Seed germination rate of 77% of 1, 2 Seed germination rate of 89%, 3 Seed germination rate of 89%;
[0044] The incubation 60h: Seed germination rate of 82% of 1, 2 Seed germination rate of 93%, 3 Seed germination rate of 90%;
[0045] The incubation 72h: Seed germination rate of 90% of 1, 2 Seed germination rate of 93%, 3 Seed germination rate of 91%;
[0046] After the above analysis on Seed, can be known, through Seed handler processing technique has the effect of germination, germination effect after 36h cultivation most obvious.
[0047] The growth of wheat seed height analysis:
[0048] 1 Wheat seeds: Untreated; 2 wheat seeds: processing 30s, the processing voltage 16KV; Wheat 3: Processing 60s, the processing voltage 16KV; wheat seeds 4: Processing 90s, the processing voltage 16KV
[0049] Ten days culture soil: wheat seeds 1 bud 85.3mm, shoot 2 wheat seeds 92.1mm, bud of wheat seeds 3 98.5mm, 103.6mm bud 4 wheat seeds.
[0050] Wheat Seed 5: untreated wheat seeds 6: Processing 30s, processing 14KV voltage, wheat seeds 7: Processing 30s, processing 16KV voltage, wheat seeds 8: Processing 30s, the processing voltage 18KV
[0051] Soil Culture Day 25: 5 seed wheat bud of 24.7mm, bud seed wheat 6 39mm, wheat seed bud 7 of 42.2mm, 49.1mm 8 of wheat seeds bud.
[0052] After ten days of wheat seed production, the present invention is processed through the processor 90s of the wheat growing more vigorously than the untreated wheat growth, at the same time the cultivation, leaf elapsed after the plasma processing handler longer growing better.
[0053] By the above-described data analysis method described plasma treatment may improve seed germination and seedling growth rate, early seedling development better crop can be produced more chlorophyll for photosynthesis, thereby enhancing the vitality of integrated crop, to ensure more healthy seedlings grown can be seen that the present invention is by seed treatment machine disclosed process can effectively promote seed germination and seedling growth, and a significant effect on the different upgrading are seeds.
[0054] The above embodiments are intended to illustrate the technical solutions of the present invention, not limiting, and those of ordinary skill in the art have other modifications or equivalents of the technical solutions of the present invention, as long as they are not departed from the spirit and scope of the technical solutions of the present invention, they should be covered. Among the claims of the invention.
