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Waste ITO target recycling method

A target and intermediate technology, applied in the field of ITO targets, can solve the problems of uncontrollable vaporization effect and uncontrollable quality of target recovery effect, and achieve high cooling efficiency

Inactive Publication Date: 2021-09-14
WUHU YINGRI TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the patent arc vaporization does not limit the temperature, but only mentions that the high temperature of the arc is 3000-6000°C, but only relying on this high temperature for vaporization, the vaporization effect is uncontrollable, so the quality of the target recovery effect is uncontrollable

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Embodiment Construction

[0014] In order to deepen the understanding of the present invention, the present invention will be further described below in conjunction with the examples, which are only used to explain the present invention, and do not constitute a limitation to the protection scope of the present invention.

[0015] This embodiment provides a method for recycling waste ITO targets, including the following steps:

[0016] Step 1: Put the waste ITO target into the gasification furnace, and the temperature of the gasification furnace rises in a gradient: 0-30min to 500°C, then keep warm, 30-40min to 3000°C, put the ITO waste target at this temperature, 40 -60min to raise the temperature to 4000-5000°C, then keep it warm until the ITO waste target is completely vaporized, and finally cool it under nitrogen atmosphere. The nitrogen gas filling rate is 6L / min for 0-3min, and then the filling rate is 2L / min to obtain a purity of 4N. , ITO powder with a specific surface area of ​​6-8;

[0017] S...

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Abstract

The invention provides a waste ITO target recycling method which comprises the steps of putting an ITO waste target into a vaporization furnace, raising the temperature in the furnace to 4000-5000 DEG C in a gradient manner, raising the temperature to 500 DEG C in 0-30 minutes, putting the ITO waste target into the vaporization furnace at the temperature, preserving the heat, raising the temperature to 3000 DEG C in 30-40 minutes, raising the temperature to 4000-5000 DEG C in 40-60 minutes, preserving the heat until the ITO waste target is completely vaporized, finally cooling in a nitrogen atmosphere to obtain ITO powder with the purity of 4N and the specific area of 6-8, and performing ball milling, isostatic cool pressing, sintering, machining and binding to finally obtain the ITO target material. Gradient heating is adopted, the waste target is put when the temperature is increased to 500 DEG C, and the temperature is increased to 4000-5000 DEG C, so that the waste target can be completely vaporized, the waste target can be well controlled to be completely vaporized, the prepared ITO powder is high in purity, and the waste target utilization effect is good.

Description

technical field [0001] The invention relates to the field of ITO targets, in particular to a recycling method for waste ITO targets. Background technique [0002] When the ITO target is used by the customer, it will not be completely used up. The utilization rate of the rotating ITO target is 75%, and the utilization rate of the planar ITO target is 35%. In line with the principle of energy regeneration and environmental protection, there will be a large number of waste targets. Recycle. The traditional industry practice is to recycle the waste ITO target into 2N indium by dry or wet method, and then refine it into 4N indium ingot by refining method. This method is costly and only uses the In and tin in the waste ITO target. The recycling value is low. The prior art patent CN102367519B discloses a high-efficiency recovery method for ITO waste targets. The plasma gasification production device is used to directly gasify the ITO target to generate ITO powder. The entire reco...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B35/01C04B35/453C04B35/622C04B35/626
CPCC04B35/01C04B35/453C04B35/62645C04B35/62605C04B35/62204C04B2235/3293C04B2235/3286
Inventor 曾墩风王志强石煜陶成
Owner WUHU YINGRI TECH CO LTD